Semiconductor structure and forming method thereof
A technology of semiconductor and isolation structure, applied in the field of semiconductor structure and its formation, can solve the problem that the performance of semiconductor structure needs to be improved, and achieve the effect of improving performance and avoiding short circuit
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0027] As mentioned in the background, the performance of existing semiconductor structures still needs to be improved. Now analyze and illustrate in conjunction with specific embodiment.
[0028] figure 1 and figure 2 It is a schematic cross-sectional structure diagram of a semiconductor structure in an embodiment.
[0029] Please refer to figure 1 and figure 2 , figure 1 for figure 2 Schematic diagram along section line AA', figure 2 for figure 1 The top view of the structure includes: a substrate 100 with a fin 101 on the substrate 100; an isolation structure 102 located on the substrate and part of the sidewall of the fin 101; a dummy gate structure 103 located on the substrate 100, the dummy The gate structure 103 spans the fin portion 101 ; the sidewall 104 is located on the sidewall of the dummy gate structure 103 .
[0030] In the semiconductor structure, when forming the dummy gate structure 103, it is necessary to form a dummy gate material layer (not sh...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com