Evaporation source feeding device and evaporation source feeding method
A technology of feeding device and evaporation source, applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problems of long evaporation time, reduced evaporation efficiency, and poor material uniformity.
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[0041] In order to make the technical problems solved by the present invention, the technical solutions adopted and the technical effects achieved clearer, the technical solutions of the embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings. Obviously, the described embodiments are only the technical solutions of the present invention. Some, but not all, embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.
[0042] Such as Figure 1-Figure 5 As shown, this embodiment provides an evaporation source supply device, which includes an evaporation assembly 3, a drive assembly, a pre-evaporation probe 41, an evaporation probe 42 and a control module, and the evaporation assembly 3 includes A working position 31 for vapor deposition and a waiting position 32 for ...
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