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Vapor deposition material and optical thin film obtained from the same

A technology for evaporation materials and optical thin films, which is applied in vacuum evaporation coating, metal material coating process, sputtering coating, etc. Public knowledge and other issues

Active Publication Date: 2010-01-27
FUJI TITANIUM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, even if such countermeasures are taken, the distribution of heat applied to the molten pool tends to fluctuate, and as a result, it is difficult to control the evaporation rate.
As mentioned above, there is no known multi-system vapor deposition material that can easily form a desired high refractive index film without taking special measures for electron beam operation.

Method used

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  • Vapor deposition material and optical thin film obtained from the same
  • Vapor deposition material and optical thin film obtained from the same
  • Vapor deposition material and optical thin film obtained from the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] Mix the powders of niobium (V) oxide and lanthanum (III) oxide at a weight ratio of 32.9:67.1 (the molar ratio of niobium and lanthanum is 37.5:62.5), and granulate the powder mixture into granules of 1 to 3 mm in size. Fired at 1300° C. for 4 hours to obtain a granular vapor deposition material. The material is based on figure 1 The X-ray diffraction pattern shown was identified as La 3 NbO 7 and LaNbO 4 .

[0052] In a commercially available vacuum vapor deposition device, a copper-made Haslina (crucible) filled with the vapor deposition material was installed, and the device was exhausted to 1.0×10 -3 After Pa, the vapor deposition material is melted by electron beam heating to form a molten pool. Next, take the overall pressure to 1.0 x 10 -2Oxygen is introduced in the form of Pa, and only the center of the molten pool is irradiated with electron beams again to generate material vapor. On the substrate pre-set in the device and heated to 300°C, the film is for...

Embodiment 2

[0060] Mix the powders of niobium (V), lanthanum (III) oxide and metallic niobium at a weight ratio of 45.5:46.5:8.0 (the molar ratio of niobium to lanthanum is 60.0:40.0), and form the powder mixture into a sheet of 1 to 3 mm In the form of a tablet, the evaporation material in the form of a tablet is obtained by firing in a vacuum at 1600°C for 4 hours. The material was identified as LaNbO based on the X-ray diffraction pattern 4 and NbO.

[0061] For each film formed by the same method as in Example 1 using this vapor deposition material, the refractive index at a wavelength of 450 nm, the shortest transmission wavelength, and the molar ratio of niobium and lanthanum were determined. The results are shown in Tables 1 and 2. The refractive index and molar ratio are the same regardless of the number of films formed, and the shortest transmission wavelength is 305 nm.

Embodiment 3

[0063] Mix the powders of niobium (V) oxide and lanthanum (III) oxide at a weight ratio of 80.3:19.7 (the molar ratio of niobium to lanthanum is 83.3:16.7), and form the powder mixture into a tablet shape of 1-3mm, and pass through Baking was performed at 1200° C. for 4 hours in the air to obtain a tablet-shaped vapor deposition material. The material was identified as LaNb based on the X-ray diffraction pattern 5 o 14 .

[0064] For each film formed by the same method as in Example 1 using this vapor deposition material, the refractive index at a wavelength of 450 nm, the shortest transmission wavelength, and the molar ratio of niobium and lanthanum were determined. The results are shown in Tables 1 and 2. The refractive index and molar ratio are the same regardless of the number of films formed, and the shortest transmission wavelength is 330 nm.

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Abstract

The invention relates to a vapor deposition material composed of a two-component oxide of niobium and lanthanum, or a vapor deposition material composed of the two-component oxide and niobium metal and / or lanthanum metal. This vapor deposition material is characterized in that the molar ratio between niobium and lanthanum is from 25:75 to 90:10.

Description

technical field [0001] The present invention relates to an evaporation material for forming an optical thin film on a base material and an optical thin film formed using the material, and particularly relates to an evaporation material for forming an optical thin film which transmits visible light and near-ultraviolet regions and has a high refractive index And the optical film formed by using the material. Background technique [0002] In this specification, an optical thin film refers to a thin film formed by applying the interference phenomenon of light that occurs on a film having a thickness corresponding to the wavelength of light to impart functions such as anti-reflection or increased reflection. [0003] Such an optical thin film is formed by disposing a single-layer film or a laminated film of about two to one hundred layers on a base material based on a previously designed film structure in order to express desired optical performance. Thereby, optical properties...

Claims

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Application Information

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IPC IPC(8): C23C14/24G02B1/11C23C14/08
CPCC23C14/0688C23C14/083C23C14/08C23C14/22C23C14/221C23C14/24G02B1/11
Inventor 高桥修平小坂金雄冈田均
Owner FUJI TITANIUM IND
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