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Specific frequency disturbance suppression method for precision motion platform

A technology of precise motion and disturbance suppression, applied in the directions of adaptive control, general control system, control/regulation system, etc., can solve the problems of blindness of disturbance suppression, inability to suppress precise frequency disturbances, etc., to enhance disturbance suppression capability, improve The effect of athletic performance

Active Publication Date: 2021-04-06
HARBIN INST OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In order to solve the problem that the traditional disturbance suppression method based on the disturbance observer is blind to disturbance suppression and cannot accurately suppress specific frequency disturbances, the present invention provides a specific frequency disturbance suppression method for precision motion platforms

Method used

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  • Specific frequency disturbance suppression method for precision motion platform
  • Specific frequency disturbance suppression method for precision motion platform
  • Specific frequency disturbance suppression method for precision motion platform

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Embodiment

[0040] Combine below figure 1 The technical solution of this embodiment will be described. Suppose the quality of the precision motion table is m=6kg, and the model is Control system Servo cycle is T s =200us, the servo frequency is f s =1 / 200us=5000Hz.

[0041] 1. According to the content of the invention, the feedback controller C is designed as follows:

[0042] Let the desired control bandwidth be f bw =30Hz, take α=3, ξ lp =0.7, then K p =m(2πfbw ) 2 / α=71061.15,f i =f bw / α 2 =3.33, f d =f bw / α=10, f lp = αf bw =90, the feedback controller C should be designed as:

[0043]

[0044] 2. According to the content of the invention, the filter Q is designed as follows:

[0045] Suppose the precision motion table is subjected to the following external disturbance force: d=0.05sin(2π*35*t)+0.1sin(2π*100*t), the disturbance force includes two frequency disturbances of 35Hz and 100Hz.

[0046] To suppress the above two frequency disturbances, the filter Q is ...

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Abstract

The invention discloses a specific frequency disturbance suppression method for a precision motion platform. The method comprises the following steps of 1, generating an expected position signal r of a precision motion platform P by a track generator Cr; 2, measuring an actual position signal y of P; 3, subtracting the r from the y to obtain a position error signal e, and enabling the e to pass through a feedback controller C to obtain a feedback control signal ufb; 4, the control signal u of the previous period passing through a filter Q to obtain a signal uQ; 5, calculating the inverse product of Q and the nominal model P0 of the precision motion platform, and obtaining uPQ after y passes; and 6, subtracting uPQ from uQ to obtain a disturbance signal estimated value; seventhly, subtracting ufb from uQ to obtain a current period control signal u, and enabling the sum up of u and an external disturbance signal d to act on P to generate a position signal y. According to the method, disturbance within a certain frequency range can be suppressed to a certain extent, and the suppression capability can be enhanced for specific frequency disturbance, so control performance of the precision motion platform is further improved.

Description

technical field [0001] The invention belongs to the field of ultra-precision equipment manufacturing, and relates to a specific frequency disturbance suppression method of a precision motion table. Background technique [0002] The precision motion table is a key component of high-end equipment such as lithography machines and CNC machine tools, and its motion performance directly determines the yield and quality of processed products. Taking my country's 28nm node immersion lithography machine as an example, it requires the mask table to be as high as 120m / s 2 Accelerate to 2m / s, and then achieve the dynamic tracking accuracy required for uniform exposure in a very short time of 8ms. The dynamic tracking error during the uniform exposure process should meet MA (Moving Average) < 1.5nm, MSD (Moving Standard Deviation) <8nm control index. To meet such a demanding performance index, the control performance of the sports platform must be maximized. However, the precisi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05B13/04
CPCG05B13/04
Inventor 宋法质刘杨董岳崔宁
Owner HARBIN INST OF TECH
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