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Array substrate and preparation method thereof, and display panel

An array substrate and side surface technology, which is applied in the field of display devices, can solve problems such as excessive ITO on the top layer, PDL overlapping problems, and abnormal slope angles, so as to prevent ITO residue problems, improve yield, and increase compactness.

Active Publication Date: 2022-08-02
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, a large area of ​​anode residue may cause a short circuit problem between pixels, and too much ITO on the top layer is over-etched, resulting in the problem of exposing silver.
like figure 1 and figure 2 As shown, when the etching process of the anode is wet-etched, the "undercut" phenomenon generally occurs, resulting in abnormal slope angles, which in turn leads to PDL (pixel definition layer) overlapping problems

Method used

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  • Array substrate and preparation method thereof, and display panel
  • Array substrate and preparation method thereof, and display panel
  • Array substrate and preparation method thereof, and display panel

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Embodiment Construction

[0026] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application.

[0027] See image 3 , image 3 It is a schematic structural diagram of a composite electrode of an array substrate in the present application; in this embodiment, an array substrate is provided. like image 3 As shown, the array substrate includes a thin film transistor layer 10, a flat layer 20, and a composite electrode layer 30 that are stacked in sequence, wherein the thin film transistor layer 10 includes an array disposed on a base su...

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Abstract

The invention discloses an array substrate, comprising a flat layer and a composite electrode disposed on the flat layer, the edge side surface of the composite electrode and the surface of the flat layer form at least one undercut structure, wherein, The composite electrode includes at least one metal electrode and at least one transparent electrode, and the metal electrode and the transparent electrode are alternately stacked.

Description

technical field [0001] The present application relates to the technical field of display devices, and in particular, to an array substrate, a preparation method thereof, and a display panel. Background technique [0002] The flexible AMOLED screen has injected new vitality into the display industry, but the yield rate has always been an important problem faced by it, and improving the yield rate is the primary task that panel manufacturers need to solve urgently. In current AMOLED products, the film-forming temperature of ITO is room temperature (about 25°C), forming amorphous (a-ITO), which often appears like anode Pin Hole (plug hole, bubble), anode "black spot" (vulcanization) , abnormal pixel display, anode etching and other yield problems, please refer to figure 1 and figure 2 , figure 1 and figure 2 It is a schematic structural diagram of a composite electrode formed by wet etching in the prior art. The composite electrode 300 includes a first electrode 310, a m...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/32H01L51/52H01L51/56G09F9/30
CPCG09F9/301H10K59/122H10K59/12H10K50/822H10K71/00
Inventor 张蕊
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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