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Fused quartz polishing method based on variable removal function atmospheric plasma

A plasma and fused silica technology, applied in the ultra-smooth and precise processing field of fused silica glass surface, can solve the problems of affecting the etching process and low processing convergence rate, and achieve the effect of high convergence rate and improved efficiency

Pending Publication Date: 2021-03-09
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI +1
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Problems solved by technology

However, since the atmospheric plasma reaction is a very complicated process, elements of different thicknesses, reaction temperature accumulation at different speeds, gas flow and other factors will affect the actual etching process
It is known from experiments that the removal function is nonlinear at different feed rates, which is inconsistent with the expected assumption of a single removal function, which makes the processing convergence rate not high

Method used

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  • Fused quartz polishing method based on variable removal function atmospheric plasma
  • Fused quartz polishing method based on variable removal function atmospheric plasma
  • Fused quartz polishing method based on variable removal function atmospheric plasma

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Embodiment Construction

[0026] Below in conjunction with the example polished fused quartz (SiO 2 ) to further illustrate the present invention, but should not limit the protection scope of the present invention with this.

[0027] The method of the invention provides a novel atmospheric plasma processing method, which introduces a single removal function as a variable into the convolution operation, so that the atmospheric plasma processing can achieve higher processing precision.

[0028] The new processing method will be clearly and systematically explained in conjunction with the atmospheric plasma processing device diagram below, and its method steps are:

[0029] Step 1: Place the experimental piece with the same specifications as the fused silica element to be processed on the processing platform of the atmospheric plasma equipment, perform precise tool setting on the workpiece, turn on the atmospheric plasma RF power supply on the sacrificial piece, and pass through the air inlet hole Into H...

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Abstract

The invention relates to the technical field of silicon-based optical element surface ultra-smooth precision processing, and in particular, relates to a fused quartz polishing method based on variableremoval function atmospheric plasma. The problem that in an existing atmospheric plasma processing process, the processing convergence rate is not high due to nonlinear change of a removal function is solved. The method comprises the steps: firstly, carrying out an early-stage variable removal function extraction experiment, then, carrying out operation on a fitted variable removal function and atheoretical removal amount to obtain residence time required by processing, and carrying out fine trimming and polishing by adopting atmospheric plasma equipment, thereby finally finishing high-precision and high-efficiency processing of the fused quartz optical element.

Description

technical field [0001] The invention relates to the technical field of ultra-smooth and precise processing of fused silica glass surfaces, in particular to a fused silica polishing method based on variable removal function atmospheric plasma. In order to solve the problem that the removal function presents a nonlinear effect during atmospheric plasma processing of fused silica, which leads to a low processing removal convergence rate. Background technique [0002] Fused silica glass has the advantages of low thermal conductivity, good thermal shock resistance, low dielectric constant, high optical transmittance and transmittance in a very wide spectral range from ultraviolet to infrared, and has become a high-power laser system, ultraviolet to infrared. Indispensable optical components in infrared optical systems. However, the surface processing defects of fused silica optical components make it face serious laser damage problems in strong laser devices, so the non-contact ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00G06F17/15
CPCC03C15/00G06F17/15
Inventor 彭冰徐学科顿爱欢吴伦哲王哲
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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