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An Array Type Electrothermal Plasma Accelerator

A plasma and accelerator technology, applied in the field of plasma accelerators, can solve the problems of small thrust adjustment range and low total thrust, and achieve the effects of expanding the adjustment range, prolonging life and being easy to control.

Active Publication Date: 2022-03-04
BEIJING RES INST OF PRECISE MECHATRONICS CONTROLS
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  • Abstract
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  • Application Information

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Problems solved by technology

[0005] The technical problem to be solved by the present invention is to overcome the problems of low total thrust and small thrust adjustment range in the prior art, and provide an array type electrothermal plasma accelerator to realize the selection and ignition of the cavity units participating in the discharge Control, under the condition of maintaining the structure and reliability advantages of the accelerator device, achieve the effect of controlling the total ablation supply and expanding the thrust adjustment range, and form a discharge chamber group through the array propellant arrangement to improve the total impulse of the accelerator device. Make it meet the needs of diverse space propulsion missions and expand the field of application

Method used

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  • An Array Type Electrothermal Plasma Accelerator
  • An Array Type Electrothermal Plasma Accelerator
  • An Array Type Electrothermal Plasma Accelerator

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Embodiment Construction

[0030] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0031] The array type electrothermal plasma accelerating device described in the present invention is as figure 1 As shown, it includes a cathode support 1, an anode base plate 2, a single nozzle cathode 3, a spark plug 4, an insulating mounting plate 5, and a single-chamber solid propellant 6.

[0032] The single nozzle cathode 3 is installed in the installation hole of the cathode support 1, and the installation holes are evenly distributed on the circumference of the porous cathode support 1, such as figure 2 Shown in side sectional view. The single-chamber solid propellant 6 is a cylinder with a central cavity, and the single-chamber solid propellant 6 is installed in the hole of the porous insulating mounting plate 5 . The inde...

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Abstract

An array-type electrothermal plasma accelerator belongs to the field of space electric propulsion technology, which overcomes the problems of uncontrollable ablation, difficult to accurately control the thrust, and low total impulse in the existing technology. The body unit is controlled to achieve the effect of controlling the amount of ablation and adjusting the thrust under the condition of maintaining the advantages of the structure and reliability of the acceleration device, and the discharge cavity group is formed by the array propellant arrangement to increase the total impact of the acceleration device. It can meet the requirements of diverse space propulsion missions and expand the field of application.

Description

technical field [0001] The invention relates to an array type electrothermal plasma accelerator, which belongs to the technical field of space electric propulsion. Background technique [0002] With the vigorous development of commercial spaceflight, the field of micro-spacecraft is constantly undergoing technological innovation and progress. In order to improve its on-orbit life, there is an increasing demand for micro propulsion systems for micro spacecraft. [0003] The electrothermal plasma accelerator has the characteristics of small system size, low cost, and high specific impulse at low power. It is one of the most potential micro-spacecraft on-orbit propulsion systems and has great development prospects. The pulse electrothermal acceleration device uses solid propellant, and the system does not contain a propellant storage tank, which greatly simplifies the structure of the propulsion system and improves the reliability of the system. [0004] In the face of increa...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F03H1/00H05H1/54
CPCF03H1/0093F03H1/0006H05H1/54
Inventor 刘祺杨磊赵絮黄玉平郑再平
Owner BEIJING RES INST OF PRECISE MECHATRONICS CONTROLS
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