Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Symmetrical semiconductor laser self-mixing grating interference three-dimensional displacement measurement system and measurement method thereof

A technology of grating interference and displacement measurement, which is applied in the direction of measuring devices, optical devices, instruments, etc., and can solve problems such as unfavorable practicality, harsh measurement environment and feedback intensity

Active Publication Date: 2021-02-02
NANJING NORMAL UNIVERSITY
View PDF3 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It has very strict requirements on the measurement environment and feedback intensity, which is not conducive to its practical application

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Symmetrical semiconductor laser self-mixing grating interference three-dimensional displacement measurement system and measurement method thereof
  • Symmetrical semiconductor laser self-mixing grating interference three-dimensional displacement measurement system and measurement method thereof
  • Symmetrical semiconductor laser self-mixing grating interference three-dimensional displacement measurement system and measurement method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0058] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments. The following are only preferred embodiments of the present invention, and the scope of protection of the present invention is not limited to the following examples, and all technical solutions under the idea of ​​the present invention belong to the scope of protection of the present invention. It should be pointed out that for those skilled in the art, some improvements and modifications without departing from the principle of the present invention should be regarded as the protection scope of the present invention.

[0059] like figure 1 As shown, the symmetrical semiconductor laser self-mixing grating interference three-dimensional displacement measurement system of the present invention includes a four-channel stable current source 1, a reflective two-dimensional planar grating 2, a first semiconductor laser 31, a second semiconductor laser...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a symmetrical semiconductor laser self-mixing grating interference three-dimensional displacement measurement system and a measurement method thereof. The system comprises a four-channel stable current source, four temperature controllers, four semiconductor lasers, four photoelectric detectors, a reflective two-dimensional plane grating, four electro-optical phase modulators, a four-channel signal generator, a voltage amplifier and a signal processing module. Output lasers of the four semiconductor lasers are modulated by the four electro-optical phase modulators respectively and then incident to the reflective two-dimensional plane grating at + / -1-order Littrow incident angles in the x direction and the y direction respectively, and diffracted light is fed back tothe corresponding semiconductor lasers in the incident direction along the original path to generate self-mixing interference. And the four paths of interference signals are converted into electric signals through the photoelectric detector and output to the signal processing module, and the three-dimensional displacement of the to-be-measured target is restored in real time. The invention has the characteristics of simple and compact structure, strong anti-interference capability and the like, and the symmetrical structure design is beneficial to improving the measurement resolution of the system.

Description

technical field [0001] The invention relates to precision displacement measurement technology, in particular to a symmetrical semiconductor laser self-mixing grating interference three-dimensional displacement measurement system and a measurement method thereof. Background technique [0002] The advancement of precision displacement measurement technology is a prerequisite for the development and progress of semiconductor manufacturing technology and precision processing technology. In recent years, the rapid development and progress of industrial production and scientific research have put forward higher and higher requirements for precision displacement measurement technology in terms of measurement accuracy, measurement dimension, measurement speed and system volume. Optical interferometers are widely used in high-precision displacement measurement due to their advantages of non-contact, high resolution and wide dynamic measurement range. Among them, traditional laser int...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/02G01B9/02
CPCG01B11/02G01B9/02092
Inventor 郭冬梅施立恒沈锺杰赵慧敏汪弋平郝辉夏巍
Owner NANJING NORMAL UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com