Application of using heteropolyacid as carrier to remove trace silicon and phosphorus impurities in nickel solution

A technology of heteropolyacid and nickel solution is applied in the application of phosphorus impurities and the field of removing trace silicon in nickel solution, which can solve the problems of inability to achieve deep desiliconization and increase the burden of impurity removal in subsequent processes, and achieves low cost, good effect, high yield effect

Active Publication Date: 2022-08-02
广东芳源新材料集团股份有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The above-mentioned method for removing silicon is mainly aimed at the removal of impurity silicon in other system high-silicon solutions, and the method for deep silicon removal in nickel solution has not been reported yet, and the silicon content in the solution after the above-mentioned method is still 0.2g / L ( 200ppm), this type of method cannot achieve the purpose of deep desiliconization; at the same time, the addition of silicon removal agent in the impurity removal process will introduce other impurity ions into the solution, increasing the burden of impurity removal in subsequent processes

Method used

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  • Application of using heteropolyacid as carrier to remove trace silicon and phosphorus impurities in nickel solution
  • Application of using heteropolyacid as carrier to remove trace silicon and phosphorus impurities in nickel solution
  • Application of using heteropolyacid as carrier to remove trace silicon and phosphorus impurities in nickel solution

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Experimental program
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Effect test

Embodiment approach 1

[0139] Add sodium molybdate with 1.5 times the molar content of Si and P heteroelements to the nickel solution, adjust the pH value of the nickel solution to 3.0, stir at room temperature for 1 hour, and then add the volume component ratio of 10% N235+30% isooctanol+ 60% kerosene heteropolyacid extractant, the volume ratio of the addition amount of the heteropolyacid extractant to the nickel solution is 1:1, and after mixing 5min, stand for stratification, and the raffinate (nickel) with Si, P impurity content below 1ppm is obtained by separation. solution) and organic phase.

Embodiment approach 2

[0141] Add ammonium molybdate with 1.5 times the molar content of Si and P heteroelements to the nickel solution, adjust the pH value of the nickel solution to 4.0, stir at room temperature for 1 hour, and then add the volume component ratio of 5% N235+50% sec-octanol+ 45% kerosene heteropolyacid extractant, the volume ratio of the addition amount of the heteropolyacid extractant to the nickel solution is 1:1, and after mixing 10min, it is left to stand for stratification, and the raffinate (nickel) with Si, P impurity content below 1ppm is obtained by separation solution) and organic phase.

Embodiment approach 3

[0143] Add potassium molybdate with 1.3 times the molar content of Si and P heteroelements to the nickel solution, adjust the pH value of the nickel solution to 2.0, stir for 2 hours at room temperature, and then add the volume component ratio of 20% N235+50% n-octanol+ 30% kerosene heteropolyacid extractant, the volume ratio of the addition amount of the heteropolyacid extractant to the nickel solution is 1:1, and after mixing 15min, stand for stratification, and the raffinate (nickel) with Si, P impurity content below 1ppm is obtained by separation. solution) and organic phase.

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Abstract

The invention discloses an application of using a heteropoly acid as a carrier to remove trace amounts of silicon and phosphorus impurities in nickel solution. The acid is removed to achieve the purpose of impurity removal. In the removal of impurities such as Si and P in the nickel solution, obvious effects have been obtained.

Description

technical field [0001] The invention relates to the technical field of hydrometallurgy, in particular to the application of using a heteropolyacid as a carrier to remove trace amounts of silicon and phosphorus impurities in a nickel solution. Background technique [0002] Nickel-cobalt-manganese ternary cathode material is a new type of cathode material for lithium-ion batteries. It has the advantages of high capacity, good thermal stability and low price. It can be widely used in small lithium batteries and lithium-ion power batteries. The product of lithium cobalt oxide has a much higher cost performance than lithium cobalt oxide, and its capacity is 10-20% higher than that of lithium cobalt oxide. It is one of the new battery materials most likely to replace lithium cobalt oxide. It is called the third-generation lithium-ion battery. For cathode materials, the domestic annual demand for cathode materials gradually replaces lithium cobalt oxide with an annual growth rate o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C22B3/22C22B3/40C22B7/00C22B23/00
CPCC22B3/22C22B7/005C22B23/00C22B3/409Y02P10/20
Inventor 吴芳龙全安罗爱平
Owner 广东芳源新材料集团股份有限公司
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