Flip Mini/Micro-LED chip easy to weld and preparation method and packaging method of flip Mini/Micro-LED chip
A packaging method and chip technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of poor final products, high precision of solder paste brushing method, easy overflow, etc., to avoid excessive or too small dosage, shorten Effect of preventing solder overflow between packages
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[0038] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0039] see figure 1 ,本发明提供的一种易于焊接的倒装Mini / Micro-LED芯片,包括衬底10、设于衬底10上的发光结构20、设于发光结构20上的电极30、以及设于电极30上的焊接层40,其中,所述倒装Mini / Micro-LED芯片的尺寸小于100μm。
[0040] 所述焊接层40包括焊料层41、设于焊料层41上的助焊层42、以及设于焊料层41和助焊层42上并将助焊层42包裹的保护层43。
[0041] 本发明的焊料层用于结合电极和基板,因此所述焊料层的材料必须为导电材料;此外,为了提高电极与基板之间的结合力,所述焊料层还用于填补电极与基板之间的空隙,减少芯片与基板之间的不平整,减少芯片与基板之间的空洞率和增加焊接层的可靠度,因此所述焊料层的材料必须具有一定的软度。优选的,所述焊料层的材料选自锡铅焊料、银焊料、铜焊料和纯锡焊料中的一种或几种。
[0042] 其中,焊料层的厚度对于芯片的后续焊接、封装起着重要的作用,若焊料层的厚度过厚,则焊接时容易溢出、导致芯片漏电;若焊料层的厚度过小,则芯片与基板结合不牢固,降低焊接良率。
[0043] 优选的,所述焊料层的厚度为10~100μm。更优的,所述焊料层的厚度为20~80μm。最优的,所述焊料层的厚度为40~60μm。
[0044] 具体的,本发明采用黄光蒸镀或钢网印刷的方式在电极上形成焊料层。在LED的晶圆阶段,本发明同时在多个发光结构的在电极上形成焊料层,与逐个LED芯片点锡膏与刷锡膏的封装方法相比,效率大大提高,且可以通过控制焊料层的厚度,精准控制锡膏的用量,避免锡膏用量过多或过小,有效保证芯片与基板的结合力,同时防止芯片旋转移位,从而提高LED芯片与基板的焊接良率。
[0045]The existing wel...
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