Forming method of metal interconnection structure
A metal interconnection structure and interconnection structure technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems affecting the service life of electrical testing equipment and affecting product yields, etc.
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[0037] A method for forming a metal interconnection structure of the present invention will be further described in detail below. The invention will now be described in more detail with reference to the accompanying drawings, in which preferred embodiments of the invention are shown, it being understood that those skilled in the art may modify the invention described herein and still achieve the advantageous effects of the invention. Therefore, the following description should be understood as the broad knowledge of those skilled in the art, but not as a limitation of the present invention.
[0038] In the interest of clarity, not all features of an actual implementation are described. In the following description, well-known functions and constructions are not described in detail since they would obscure the invention with unnecessary detail. It should be appreciated that in the development of any actual embodiment, numerous implementation details must be worked out to achie...
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