Bromomethane impurity removal process adopting weak base
A methyl bromide and process technology, which is applied in the field of methyl bromide impurity removal process using a weak base, can solve the problems of low methyl bromide yield and high loss rate of methyl bromide, and achieve the effects of low corrosion performance, reduced energy consumption for impurity removal, and improved yield
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Embodiment 1
[0030] A kind of methyl bromide impurity removal process that adopts weak base comprises the following steps:
[0031] Step 1: Methyl bromide gas is passed into the first absorption tower with a ventilation rate of 220m³ / h from the bottom of the first absorption tower, and is discharged from the top of the first absorption tower; the weak base solution containing sodium acetate and barium carbonate is The spray volume of 1.5m³ / h is sprayed from the top of the first absorption tower and discharged from the bottom of the first absorption tower; among them, the pH of the weak alkali solution is 9, and the height of the packing layer is 3m; methyl bromide is passed into the first absorption tower The temperature of the tower is 25° C., the temperature of the weak base solution spraying is 30° C., and the pressure inside the first absorption tower is 1.4 atm.
[0032] Step 2: the methyl bromide discharged in step 1 is passed into the second absorption tower from the bottom of the s...
Embodiment 2
[0035] A kind of methyl bromide impurity removal process that adopts weak base comprises the following steps:
[0036] Step 1: Methyl bromide gas is passed into the first absorption tower from the bottom of the first absorption tower with a ventilation rate of 224m³ / h, and discharged from the top of the first absorption tower; the weak base solution containing sodium carbonate and sodium bicarbonate Spray from the top of the first absorption tower with a spray rate of 1.75m³ / h, and discharge from the bottom of the first absorption tower; wherein, the pH of the weak alkali solution is 8.5, and the height of the packing layer is 3.25m; The temperature of the first absorption tower is 27.5°C, the temperature of the weak alkali solution spraying is 35°C, and the pressure inside the first absorption tower is 1.45atm.
[0037] Step 2: the methyl bromide discharged in the step 1 is passed into the second absorption tower with the ventilation rate of 224m³ / h from the bottom of the sec...
Embodiment 3
[0040] A kind of methyl bromide impurity removal process that adopts weak base comprises the following steps:
[0041] Step 1: Methyl bromide gas is passed into the first absorption tower with a ventilation rate of 228m³ / h from the bottom of the first absorption tower, and discharged from the top of the first absorption tower; the weak base solution containing sodium carbonate and sodium bicarbonate Spray from the top of the first absorption tower with a spray volume of 2m³ / h, and discharge from the bottom of the first absorption tower; wherein, the pH of the weak alkali solution is 8, and the height of the packing layer is 3.5m; methyl bromide is passed into the first The temperature of the absorption tower is 30° C., the temperature of the weak base solution spraying is 40° C., and the pressure inside the first absorption tower is 1.5 atm.
[0042] Step 2: the methyl bromide discharged in the step 1 is passed into the second absorption tower with the ventilation rate of 228m...
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