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Nanoimprint process monitoring method, nanoimprint process monitoring device and nanoimprint equipment

A technology of nanoimprinting and monitoring devices, which is applied in the direction of photomechanical equipment, pattern surface photolithography, instruments, etc., to achieve the effects of real-time monitoring, efficiency improvement and yield rate

Pending Publication Date: 2020-11-13
GOERTEK INC
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although these methods can accurately reflect the surface morphology of imprinted products and carry out detailed process analysis, they cannot provide real-time process monitoring in nanoimprint mass production.

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  • Nanoimprint process monitoring method, nanoimprint process monitoring device and nanoimprint equipment

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Embodiment Construction

[0043] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0044] It should be noted that if there are directional indications (such as up, down, left, right, front, back...) in the embodiment of the present invention, the directional indications are only used to explain how to move in a certain posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication will also change accordingly.

[0045] In addition, if there are descriptions involving "first", "second" an...

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Abstract

The invention discloses a nanoimprint process monitoring method, a nanoimprint process monitoring device and nanoimprint equipment, and the nanoimprint process monitoring method comprises the following steps: a light source emits a monitoring laser to a PCM module on a to-be-monitored object, wherein the to-be-monitored object comprises a nanoimprint template and / or a nanoimprint product; an imaging module receives the reflected laser of the PCM module to obtain a reflected light spot formed by the reflected laser; and a processor acquires the reflected light spot fed back by the imaging module and judges whether the to-be-monitored object is qualified or not according to the reflected light spot. According to the technical scheme, the PCM module is monitored through the monitoring laser,indirect non-contact real-time process monitoring can be conducted on the to-be-monitored object, and therefore real-time process monitoring is provided in nanoimprint lithography mass production.

Description

technical field [0001] The invention relates to the field of process monitoring, in particular to a nano-imprint process monitoring method, a monitoring device and nano-imprint equipment. Background technique [0002] At present, the monitoring of the nanoimprint process is mainly based on indirect, off-line monitoring methods for nanoimprinted products, including the application of non-destructive testing methods such as optical microscopy and atomic force microscopy to directly surface the imprinted nanostructures. Morphological characterization; using electron microscopy to analyze the surface and section structure of nanoimprinted products, etc. Although these methods can accurately reflect the surface morphology of imprinted products and carry out detailed process analysis, they cannot provide real-time process monitoring in mass production of nanoimprinting. Contents of the invention [0003] The main purpose of the present invention is to propose a nanoimprint proc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002
Inventor 臧法珩赵东峰李琨董立超杜凯凯艾立夫王喆饶轶
Owner GOERTEK INC
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