Blind hole filling electroplating copper solution and application thereof

A copper electroplating and solution technology, which is applied in the field of blind hole filling electroplating copper solution, can solve the problem that the flatness cannot be fully satisfied, 5-10 microns, and even 15 microns at the maximum, and achieve good flatness.

Active Publication Date: 2020-07-03
SHENZHEN BANMING SCI & TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing electroplating additives used for filling traditional HDI blind holes often have certain depressions or protrusions on the surface of the filled blind holes, generally 5-10 microns, and even 15 microns at the maximum, and the flatness cannot be fully satisfied. In order to improve the quality of such substrates, it is necessary to develop high planarity additive products that meet the blind hole filling requirements of substrates.

Method used

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  • Blind hole filling electroplating copper solution and application thereof
  • Blind hole filling electroplating copper solution and application thereof
  • Blind hole filling electroplating copper solution and application thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0036] A copper electroplating solution for blind hole filling, the contents of each component in the copper electroplating solution are as follows: sulfuric acid 40-120g / L, copper sulfate pentahydrate 120-240g / L, chloride ions 40-80ppm, accelerator 0.2-2mL / L, inhibitor 10-30mL / L, leveler 1-10mL / L. Water is the solvent. The accelerator is a 10 g / L aqueous solution of sodium alcoholthiopropane sulfonate or a 10 g / L aqueous solution of sodium polydithiodipropane sulfonate. Described inhibitor is the polyethylene glycol aqueous solution of 10g / L, the polypropylene glycol-polyethylene glycol-polypropylene glycol triblock copolymer aqueous solution of 10g / L, the ethylene oxide-propylene oxide block of 10g / L One of the aqueous solution of the copolymer; the molecular weight of the inhibitor is 4000-10000. The leveling agent is an aqueous solution composed of isonicotinic acid compounds and oligomeric quaternary ammonium compounds in a mass ratio of 1:2-2:1, and the solute concent...

Embodiment 2

[0040] The application of the copper electroplating solution for filling blind vias in the above-mentioned embodiment 1 is applied to filling blind vias of similar substrates. The electroplating process conditions for filling the blind holes of the carrier board are as follows: the current density is 0.5-5A / dm 2 , the temperature is 10-40°C.

[0041] In order to further discuss the feasibility of the present invention, specific test examples based on the technical content, structural features, achieved goals and effects of the present invention will be described in detail with the accompanying drawings.

[0042] Reagent pre-preparation

[0043] For the convenience of testing, the accelerator, inhibitor, and leveling agent were respectively prepared into aqueous solutions with a solute content of 10 g / L.

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Abstract

The invention provides a blind hole filling electroplating copper solution. The electroplating copper solution comprises the components of 40g / L to 120g / L of sulfuric acid, 120g / L to 240g / L of coppersulfate pentahydrate, 40ppm to 80ppm of chloride ions, 0.2ml / L to 2ml / L of an accelerator, 10ml / L to 30ml / L of an inhibitor, and 1ml / L to 10ml / L of a leveling agent. The leveling agent is an aqueous solution formed by mixing isonicotinic acid compounds and oligomeric quaternary ammonium compounds according to the mass ratio of 1 to 2 or 2 to 1. The solute concentration of the leveling agent is 10g / L. Because of the mutual collaborative mating action between the isonicotinic acid compounds and oligomeric quaternary ammonium compounds in the leveling agent and the other components in the electroplating copper solution, the blind hole filling electroplating process is taken under effective control, it is achieved that the surfaces of filled blind holes are good in smoothness, and sunken partsor protruding parts on the surfaces of hole ports of the filled blind holes are smaller than 5 microns in size.

Description

technical field [0001] The invention relates to the technical field of circuit board electroplating, in particular to a blind hole filling electroplating copper solution and application thereof. Background technique [0002] In recent years, with the rapid development of electronic industry technology, many electronic products must not only have powerful functions, but also have good portability, so the volume of electronic products is getting smaller and smaller, and the functions are more and more concentrated. As the mother of electronic products, the circuit board must increase the circuit density as much as possible to save limited space, so it is an inevitable trend to refine and thin the circuit board. In order to make the PCB accommodate more components while reducing its size and weight, the circuit board is constantly decreasing in terms of wire width, line spacing, hole diameter and hole spacing, and the thickness of the conductor layer and insulating layer. . T...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D5/02C25D3/38
CPCC25D5/02C25D3/38
Inventor 宗高亮谢慈育夏海郝意
Owner SHENZHEN BANMING SCI & TECH CO LTD
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