Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

A method of coating nano-starch microspheres by atomic layer deposition

An atomic layer deposition and nanostarch technology, which is applied in the fields of nanotechnology, nanomagnetism, and nanotechnology for materials and surface science. problem, to achieve the effect of favoring stability, increasing magnetic content, and narrowing particle size distribution.

Active Publication Date: 2022-05-13
HUST WUXI RES INST
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The present invention utilizes atomic layer deposition equipment to select precursors with suitable activity and vapor pressure to alternately pass in under appropriate reaction temperature and pressure, and forms a single-layer chemical adsorption on the surface of nano starch microspheres through the exchange of active functional groups and completes self-limiting chemistry. Half-reaction, the deposited substance can be plated layer by layer on the surface of nano starch microspheres in the form of a monoatomic film on the nanometer scale, and the various parts of the surface can be coated with a film of uniform thickness, which can solve the current nano Starch microspheres are easy to be infected by organisms when exposed to light and water, low magnetic content, and difficult to control the particle size of magnetic particles. The formed nano-scale film does not affect the surface adsorption performance and biodegradability of nano-starch microspheres.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method of coating nano-starch microspheres by atomic layer deposition
  • A method of coating nano-starch microspheres by atomic layer deposition
  • A method of coating nano-starch microspheres by atomic layer deposition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] A method of coating nano-starch microspheres by atomic layer deposition, surface modification of nano-starch microspheres with a particle size of 20nm, coating 5nm Fe 2 o 3 Thin films and 1nm Al 2 o 3 Thin film, where C is selected 10 h 10 Fe / O 3 , Al(CH 3 ) 3 / H 2 O is a precursor, which specifically includes the following steps:

[0035] (1) Iron oxide coating:

[0036] 1.1 After passing the nano-starch microspheres through the 800-mesh screen, weigh 5 mg and place it in the powder container of the atomic layer deposition equipment, put the powder container into the cavity, and evacuate to 10Pa;

[0037]1.2 Turn on the ultrasonic vibration, set the ultrasonic frequency to 20KHz, the working time of the ultrasonic vibration is 60s, and the intermittent time is 5s;

[0038] 1.3 Heat the cavity, and at the same time, feed the carrier gas to clean the surface of the nano-starch microspheres for 30 minutes and disperse them. The flow rate of the carrier gas is se...

Embodiment 2

[0053] A method of coating nano-starch microspheres by atomic layer deposition, surface modification of nano-starch microspheres with a particle size of 20nm, coating 5nm Fe 2 o 3 Thin films and 1nm Al 2 o 3 Thin film, where C is selected 10 h 10 Fe / O 3 , Al(CH 3 ) 3 / H 2 O is a precursor, which specifically includes the following steps:

[0054] (1) Iron oxide coating:

[0055] 1.1 After passing the nano starch microspheres through the 800 mesh screen, weigh 100g and place it in the powder container of the atomic layer deposition equipment, put the powder container into the cavity, and evacuate to 10Pa;

[0056] 1.2 Turn on the ultrasonic vibration, set the ultrasonic frequency to 40KHz, the working time of the ultrasonic vibration is 5min, and the intermittent time is 5s;

[0057] 1.3 Heat the cavity, and at the same time, pass the carrier gas to clean the surface of the nano-starch microspheres for 50 minutes and disperse them, and select the flow rate of the carr...

Embodiment 3

[0072] A method of coating nano-starch microspheres by atomic layer deposition, surface modification of nano-starch microspheres with a particle size of 10 μm, and coating with 5nm Fe 2 o 3 Thin films and 1nm SiO 2 Thin film, where C is selected 10 h 10 Fe / O 3 、SiCl 4 / H 2 O is a precursor, which specifically includes the following steps:

[0073] (1) Iron oxide coating:

[0074] 1.1 After passing the nano starch microspheres through the 800 mesh screen, weigh 200g and place it in the powder container of the atomic layer deposition equipment, put the powder container into the cavity, and evacuate to 10Pa;

[0075] 1.2 Turn on the ultrasonic vibration, set the ultrasonic frequency to 40KHz, the working time of the ultrasonic vibration is 10min, and the intermittent time is 5s;

[0076] 1.3 Heat the cavity, and at the same time pass the carrier gas to clean the surface of the nano-starch microspheres for 50 minutes and disperse them. The flow rate of the carrier gas is s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
particle diameteraaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of modification of nano-starch microspheres, and in particular relates to a method for coating nano-starch microspheres by atomic layer deposition. In the present invention, nano-starch microspheres are placed in an ultrasonic vertical fluidized atomic layer deposition device, and ultrasonic vibration is turned on. The surface of the ball forms a single layer of chemical adsorption through the exchange of active functional groups and completes a self-limiting chemical half-reaction to form a dense film, which covers all parts of the surface with a film of uniform thickness. The coating uniformity of the nano-film produced by the atomic layer deposition technology in the present invention is high, especially for the nano-starch microspheres with small particles, which can be uniformly coated, and the formed nano-film has a dense structure, uniform thickness, and excellent consistency Due to the characteristics of its reaction mechanism, it can realize the coating of nano-starch microspheres with different particle sizes.

Description

technical field [0001] The invention belongs to the technical field of modification of nano-starch microspheres, relates to a method for surface modification of nano-starch microspheres, in particular to a method for coating nano-starch microspheres by atomic layer deposition. Background technique [0002] As a drug carrier, magnetic starch microspheres can use an external magnetic field to guide their directional movement and concentration in the body, so that the drug can be selectively distributed in specific organs, tissues or cells, so as to achieve the purpose of directional action on the target tissue. Increase the drug concentration in the diseased tissue, improve the utilization rate of the drug, and reduce or eliminate the toxic and side effects of the drug on the normal tissue. However, as a drug carrier, nano-starch microspheres still have insufficient adsorption force between the drug and the starch surface, and are prone to biological contamination at room temp...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/455C23C16/40A61K41/00A61K9/50A61K47/36A61K47/02B82Y25/00B82Y30/00B82Y40/00
CPCC23C16/45529C23C16/4401C23C16/4417C23C16/4418C23C16/406C23C16/403C23C16/402A61K41/00A61K9/5036A61K9/5094A61K9/5089B82Y25/00B82Y30/00B82Y40/00
Inventor 陈蓉闫占奎刘潇单斌
Owner HUST WUXI RES INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products