Active matrix substrate and display device

An active matrix and display device technology, applied in the field of active matrix substrates and display devices, can solve problems such as display quality degradation, and achieve the effect of reducing display quality degradation

Active Publication Date: 2020-04-17
SHARP KK
View PDF15 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, when an opening is provided in an active matrix display device, the gate line and the source line must be extended so as to bypass the opening.
[0004] Although the detoured portion of the gate line and the source line can be arranged in the display area, if it is arranged in the display area, as disclosed in Patent Document 3, it may be caused by the gap between the detoured portion and the pixel electrode. Parasitic capacitance degrades display quality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Active matrix substrate and display device
  • Active matrix substrate and display device
  • Active matrix substrate and display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0033] Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.

[0034] (watch)

[0035] figure 1 It is a plan view showing a schematic configuration of a wristwatch 80 including a liquid crystal display panel 70 (display device) according to Embodiment 1 of the present invention.

[0036] Such as figure 1 As shown, a wristwatch 80 is an analog clock that displays time by rotating an hour hand 81 , a minute hand 82 , and a second hand 83 around a drive shaft 84 , and uses a liquid crystal display panel 70 for its dial. The driving shaft 84 passes through the opening 64 of the liquid crystal display panel 70 and is coupled to a mechanical driving mechanism built in the back of the liquid crystal display panel 70 . In addition, the liquid crystal display panel 70 is connected to the source driver 2 , the odd-numbered gate driver 3 and the even-numbered gate driver 4 , and the control circuit 76 built in the wristwatch...

Embodiment approach 2

[0221] Below, based on Figure 10 and Figure 11 Another embodiment of the present invention will be described. In addition, for convenience of description, members having the same functions as those described in the above-mentioned embodiments are denoted by the same reference numerals, and description thereof will be omitted.

[0222] Figure 10 It is a plan view showing a schematic configuration of an active matrix substrate 1' according to Embodiment 2. For convenience of illustration, the illustration of the gate line GL passing through the inner non-display area 12, the pixel electrode 50, etc. is omitted.

[0223] Such as Figure 10 As shown, like the active matrix substrate 1 of the first embodiment described above, the active matrix substrate 1' of the second embodiment includes: an insulating substrate 10, 2M gate lines GL, and 12N roots intersecting the gate lines GL. The pole line SL, the pixel transistor 40 corresponding to the intersection of the gate line G...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention makes it possible to suppress a deterioration in display quality in a partial region corresponding to a source line passing through an internal non-display region in a display region. The arrangement of source lines (R, B, G) passing through an internal non-display region (12) is altered at an upper alteration region (13) and a lower alteration region (16) so that the simultaneously-driven source lines (R, B, G) are not adjacent to each other in a display region (17) and are adjacent to each other in a passthrough region (14).

Description

technical field [0001] The invention relates to an active matrix substrate and a display device. In particular, the present invention relates to an active matrix substrate and a display device in which part or all of the source lines are provided with bypass portions. Background technique [0002] In recent years, it has become popular to provide apertures in active matrix display devices and to use the display devices in combination with other devices. For example, the display device is used for a dial surface of an analog watch as in Patent Document 1, or for a game machine in which a part of a reel of a game machine is exposed as in Patent Document 2. [0003] However, when openings are provided in an active matrix display device, gate lines and source lines must be extended so as to bypass the openings. [0004] Although the detoured portion of the gate line and the source line can be arranged in the display area, if it is arranged in the display area, as disclosed in ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G09F9/30G02F1/1333G02F1/1368G09F9/302H01L21/336H01L29/786
CPCG02F1/136286G02F2201/56G09F9/30G09F9/302H01L29/786G02F1/133514G02F1/1368G02F1/133388
Inventor 海濑泰佳伊奈惠一村上祐一郎古田成山中秀一
Owner SHARP KK
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products