A three-dimensional integrated metasurface device, its preparation method and application
A three-dimensional integration and metasurface technology, which is applied in the direction of instruments, optical components, optical waveguides, etc., can solve the problems of inability to realize electromagnetic waves, separation, and limited multifunctional devices.
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[0100] This example is used to illustrate the preparation method of the multifunctional three-dimensional integrated metasurface device of the present invention.
[0101] figure 1 A process flow diagram of the three-dimensional integrated metasurface device for realizing the separation of space and wavelength of cross-polarized light prepared in Example 1 of the present invention is shown.
[0102] Step S1. Deposit a metal film 2 on a clean substrate 1 as a light reflection layer; the substrate can be quartz, silicon, sapphire, etc.; the metal reflection layer requires its reflectivity to be close to a value of 1, such as gold, aluminum, silver, etc.; used The deposition method can be one of physical vapor deposition or chemical vapor deposition.
[0103] Step S2. On the metal film obtained in step S1, deposit a multilayer dielectric 3 and metal 4 film in sequence; the metal material is gold, silver, aluminum, aluminum-doped zinc oxide, etc., and the dielectric material is zi...
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