Device for reducing ignition of ion source gas supply pipeline and ion source hydrogen pipeline

A gas supply pipeline and ion source technology, applied in the direction of ion beam tubes, circuits, discharge tubes, etc., can solve the problems of system equipment damage, reduce the use efficiency of ion sources, etc., and achieve the prevention of ignition damage, simple structure, and convenient management Effect

Pending Publication Date: 2020-03-17
CHINA INSTITUTE OF ATOMIC ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] One of the objectives of the present invention is to provide a device for mitigating the ignition of the ion source gas supply pipeline, which is used to solve the damage caused by ignition in the ion source gas supply pipeline to the additional devices of the ion source equipment or the system equipment connected to it and reduce the Ion Source Efficiency Issues

Method used

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  • Device for reducing ignition of ion source gas supply pipeline and ion source hydrogen pipeline
  • Device for reducing ignition of ion source gas supply pipeline and ion source hydrogen pipeline
  • Device for reducing ignition of ion source gas supply pipeline and ion source hydrogen pipeline

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Embodiment Construction

[0037] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0038] It should be noted that if there is a directional indication (such as up, down, left, right, front, back...) in the embodiment of the present invention, the directional indication is only used to explain the position in a certain posture (as shown in the accompanying drawing). If the specific posture changes, the directional indication will also change accordingly.

[0039] In order to facilitate the understanding of the technical solution of t...

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Abstract

The invention relates to a device for reducing the ignition of an ion source gas supply pipeline and an ion source hydrogen pipeline. The device comprises a floating gate electrode tip and a groundingelectrode holder, the floating gate electrode tip is provided with a cavity wall with an air hole, and the cavity wall is provided with a plurality of floating gate electrode columns which are closely arranged. The grounding electrode holder is provided with a grounding surface with an air hole, and the grounding electrode holder and the floating gate electrode tip are combined through a pipelineinsulating shell, so that the floating gate electrode columns are accommodated in a cavity formed by the pipeline insulating shell, the grounding surface and the cavity wall. Moreover, a gap distancepromoting the ignition is formed between the suspension end parts of the floating gate electrode columns and the grounding surface of the grounding electrode seat, so that the accumulated charges ina first gas pipeline are released in advance. According to the present invention, an additional device aiming at the iron source equipment is comprised to prevent the ignition discharge effect of a pipeline at the rear end.

Description

technical field [0001] The invention relates to the technical field of additional devices for ion source equipment, in particular to a device for mitigating sparking in an ion source gas supply pipeline and an ion source hydrogen pipeline. Background technique [0002] The application of ions is becoming more and more important to human life. In the applications of treatment, biological conditioning, coating, implanted film modification, static elimination, etc., corresponding types of ion accelerators are required to emit proton plasma beams, ion accelerators The core device is the ion source equipment, which draws out the particle flow with high voltage. Usually, a large amount of charge will accumulate in the ion source equipment to cause sparking, and the sparking will damage the additional device connected to the ion source device along the gas supply line, and even damage other system equipment connected to the ion source device, causing damage to the additional device...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H7/08H01J27/02
CPCH01J27/022H05H7/08H05H2007/082
Inventor 侯世刚
Owner CHINA INSTITUTE OF ATOMIC ENERGY
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