Heating device and chemical vapor deposition system

A chemical vapor deposition and heating device technology, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems that cannot meet the temperature uniformity of epitaxial substrates, etc., and achieve the improvement of photoelectric uniformity and increase the temperature The effect of uniformity and good thickness uniformity

Inactive Publication Date: 2019-12-31
PLAYNITRIDE DISPLAY CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, with the increase in the size of the epitaxial substrate and the reduction in the size of the light-emitting diode element, the above-mentioned configuration relationship between the carrier and the carrier can no longer meet the temperature uniformity required by the epitaxial substrate during film formation.

Method used

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  • Heating device and chemical vapor deposition system
  • Heating device and chemical vapor deposition system
  • Heating device and chemical vapor deposition system

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Embodiment Construction

[0063] figure 1 is a partially exploded schematic diagram of the heating device of the first embodiment of the present invention. figure 2 is a schematic cross-sectional view of a chemical vapor deposition system according to an embodiment of the present invention. Please refer to figure 1 and figure 2 , the chemical vapor deposition system 1 includes a chamber 50 , a heating device 100 , an air inlet unit 20 and a rotary driving mechanism 30 . The heating device 100 includes a stage 110 , a plurality of trays 120 and a heater 130 . The carrier plate 120 is configured to position the epitaxial substrate ES on the carrier platform 110 . The carrier plate 120 and the heater 130 are respectively disposed on opposite sides of the carrier platform 110 . Specifically, the carrying platform 110 has a first surface 110a and a second surface 110b opposite to each other, and a plurality of grooves 110g disposed on the first surface 110a. The carrier plates 120 are respectively dis...

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Abstract

The invention provides a heating device. The heating device comprises a bearing table, a plurality of carrying discs, a first heater and a second heater; the bearing table is provided with a revolution shaft. A plurality of carrying discs are arranged on the bearing table; the bearing table drives the carrying discs to revolve with the revolution shaft as the center; the first heater is arranged under the bearing table; the first heater has a first width in a radial direction of the revolution shaft; the second heater is arranged under the bearing table; the second heater and the first heaterare separated from each other; and the second heater has a second width in a radial direction of the revolution shaft, and the first width is not equal to the second width. A chemical vapor depositionsystem employing a heating device is also proposed.

Description

technical field [0001] The invention relates to a film forming device, in particular to a heating device and a chemical vapor deposition system. Background technique [0002] As the operational performance and reliability of light-emitting diode materials continue to improve, their application fields are gradually diversified, such as lighting devices, displays, and backlight modules. In order to meet the performance specifications under various usage requirements, light-emitting diode elements of different styles or materials are constantly challenging the design and mass production capabilities of related manufacturers. For example, for micro-LEDs used in displays, the film thickness uniformity of the epitaxial layer needs to reach a certain level to meet the required display quality (such as color rendering or brightness uniformity of the display surface). [0003] Chemical vapor deposition (chemical vapor deposition, CVD) technology is one of the more commonly used tech...

Claims

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Application Information

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IPC IPC(8): C23C16/46C23C16/458
CPCC23C16/4581C23C16/46
Inventor 吴俊德赖彦霖陈佶亨
Owner PLAYNITRIDE DISPLAY CO LTD
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