Mask

A technology of masks and masks, which is applied in the field of masks, can solve the problems of thin mask thickness, reduced mesh opening accuracy, mask wrinkles, bending or twisting, etc., to achieve uniform force and flatness Improved effect

Active Publication Date: 2019-11-08
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Especially with the improvement of resolution, the arrangement of pixel openings on the mask will become denser and smaller, and because of the angle limitation, the thickness of the mask becomes very thin
When the mask is stretched, applying force along the long side of the mask will easily cause the mask to wrinkle, bend or twist, reducing the precision of the stretching

Method used

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Examples

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Embodiment Construction

[0029] The application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain related inventions, rather than to limit the invention. It should also be noted that, for ease of description, only parts related to the invention are shown in the drawings.

[0030] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure shall have the usual meanings understood by those skilled in the art to which the present invention belongs. "First", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "Comprising" or "comprising" and similar words mean that the elements or items appearing before the word include the elements or items listed after the word and their equivalents, without excluding other el...

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PUM

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Abstract

The invention discloses a mask. The mask comprises a mask pattern region and a non-mask pattern region located at the periphery of the mask pattern region; the boundary between the mask pattern regionand the non-mask pattern region is a non-linear type geometric figure, and the geometric figure is sunken towards the mask pattern region; and a fixing region is arranged in the non-mask pattern region, the fixing region is used for fixing the mask, and the geometric figure is positioned on the opposite surface of the fixing region.

Description

technical field [0001] The present disclosure generally relates to the field of mask technology, and in particular, to a mask plate. Background technique [0002] As an emerging display and lighting technology, organic light-emitting diode (Qrganic Light-emitting Diode, OLED) has become a research hotspot. Generally, OLEDs are prepared by vacuum evaporation. To achieve different resolutions of the display screen, it is necessary to produce a corresponding number of pixels, and the pixels are composed of three sub-pixels of red, green, and blue, so three sub-pixels need to be produced separately, which requires the mask plate and the substrate collocation. [0003] In the evaporation process, the evaporation source will have a certain evaporation angle. At this time, it is required that the pixel opening of the mask plate has an angle less than or equal to the evaporation angle, so as to minimize the shadow (Shadow) and improve the deposition accuracy of the film layer. , ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24C23C14/12H10K71/166
Inventor 杜帅冯宏庆郑勇丁文彪
Owner BOE TECH GRP CO LTD
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