Vacuum chamber leak rate monitoring method

Abstract

The invention relates to a method for monitoring the leakage rate of a vacuum cavity, and relates to a semiconductor integrated circuit manufacturing process. The emission spectrum of a functional group in a vacuum cavity during the semiconductor manufacturing process is collected by a spectral signal detector, and the emission spectrum is obtained by using an emission spectrum signal processing device. The spectral signal intensity waveform of the spectrum, and by judging whether there is a five-finger mountain-shaped waveform section near the wavelength of nitrogen of 336.5nm in the spectral signal intensity waveform to realize the vacuum chamber leak rate monitoring, this method can determine the vacuum chamber leak without any difference Whether the rate is abnormal, and the cost is low, the leak rate of the reaction chamber can be detected without shutting down the semiconductor manufacturing equipment, and the production capacity is not affected, so the leak rate of the vacuum chamber can be continuously monitored.

Description

technical field [0001] The invention relates to a semiconductor integrated circuit manufacturing process, in particular to a method for monitoring the leakage rate of a vacuum cavity. Background technique [0002] In the manufacturing process of semiconductor devices, part of the manufacturing process needs to be carried out in a reaction chamber in a vacuum environment. If there is a leak in the vacuum reaction chamber, that is, the atmosphere enters the reaction chamber, it will affect the quality of the semiconductor manufacturing process, and then affect the quality of the semiconductor device. device yield. [0003] Nitrogen (N2) is the gas with the highest content in the atmosphere, so it is used as the target gas for leak rate detection in the reaction chamber. At present, helium detectors are often used to detect the leakage rate of the reaction chamber. The helium detector can accurately detect the leakage of the atmosphere, but the specific leakage in the vacuum r...

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Problems solved by technology

In addition, the cost of helium detector equipment is relatively high, and the leakage rate of the reaction chamber needs to be shut down to detect the leakage rate of the reaction chamber, resulting in loss of production capacity, and it can only detect the leakage rate of the reaction chamber during detection, and the semiconductor manufacturing equipment is running Reaction chamber leak rate cannot be detected at this time, so continuous monitoring is not possible

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