Preparation method of NiO hole transporting layer of perovskite solar cell
A technology for solar cells and hole transport layers, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of high preparation temperature not suitable for flexible substrates, difficulty in achieving large-area deposition, continuous coating, etc., to achieve continuous NiO Hole transport layer, effect of lowering the preparation temperature
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Embodiment 1
[0030] The preparation method of above-mentioned NiO hole transport layer comprises the following steps:
[0031] S101. Take 60g of NiO with an average particle size≤100nm and 20g of NiO with an average particle size≤25um, set aside;
[0032] S102. Place the nano-NiO particles in step S101 in 50 mL of distilled water, and disperse them uniformly by ultrasonic;
[0033] S103. Place the micron NiO particles in step S101 in 10 mL of distilled water, and disperse them uniformly by ultrasonic;
[0034] S104. The nano-NiO dispersion in step S102 is added to a reactor equipped with a stirring device and a heating device. At a stirring rate of 180r / min, first slowly add 5g of sodium hexametaphosphate into the reactor, and after fully dissolving , then slowly add the NiO dispersion in step S103 into the reactor, stir at 180r / min for 2h, and then evaporate and remove the solvent at a temperature of 120°C and a stirring rate of 600r / min;
[0035] S105. Add 25mL of distilled water into ...
Embodiment 2
[0039] The preparation method of above-mentioned NiO hole transport layer comprises the following steps:
[0040] S201. Take 70g of NiO with an average particle size≤100nm and 10g of NiO with an average particle size≤25um, and set aside;
[0041] S202. Place the nano-NiO particles in step S201 in 50mL distilled water, and disperse them uniformly by ultrasonic;
[0042] S203. Place the micron NiO particles in step S201 in 10 mL of distilled water, and disperse them uniformly by ultrasonic;
[0043] S204. The nano-NiO dispersion in step S202 is added to a reactor equipped with a stirring device and a heating device. At a stirring rate of 200r / min, first slowly add 8g of sodium hexametaphosphate into the reactor, and after fully dissolving , then slowly add the NiO dispersion in step S203 into the reactor, stir at 200r / min for 2h, and then evaporate and remove the solvent at a temperature of 110°C and a stirring rate of 500r / min;
[0044] S205. Add 25mL of distilled water into ...
Embodiment 3
[0048] The preparation method of above-mentioned NiO hole transport layer comprises the following steps:
[0049] S301. Take 80g of NiO with an average particle size of ≤100nm and 5g of NiO with an average particle size of ≤25um for later use;
[0050] S302. Place the nano-NiO particles in step S301 in 50mL distilled water, and disperse them uniformly by ultrasonic;
[0051] S303. Place the micron NiO particles in step S301 in 10 mL of distilled water, and disperse them uniformly by ultrasonic;
[0052] S304. The nano-NiO dispersion in step S302 is added to a reactor equipped with a stirring device and a heating device. At a stirring rate of 300r / min, first slowly add 10g of sodium hexametaphosphate into the reactor, and after fully dissolving , then slowly add the NiO dispersion in step S303 into the reactor, stir at 300r / min for 2h, and then evaporate and remove the solvent at a temperature of 105°C and a stirring rate of 300r / min;
[0053] S305. Add 25mL of distilled wate...
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