Good manufacturing practice (GMP) workshop and design method of GMP workshop human logistics dual perpendicular through layout

Abstract

The invention provides a good manufacturing practice (GMP) workshop and a design method of GMP workshop human logistics dual perpendicular through layout, and relates to the design method and layout used for the GMP workshop. The GMP workshop and the design method of the GMP workshop are simple in structure, low in cost and simple and convenient in design. The design method comprises the steps that logistics perpendicular layout is adopted in logistics to enable the GMP workshop to become upper and lower layer construction, then personnel channels are arranged between various rooms with a sameclean grade of different layers to from clean areas of various grades, and clothes changing systems are separately arranged in the clean areas of the grades. On the basis of meeting the GMP standardbasis requirement, the problem that personnel waste or repeating clothes changing of same operating personnel caused by the personnel with the same clean grade of the upper layer and the lower layer separately changing clothes during the perpendicular layout of the GMP workshop logistics is solved. According to the GMP workshop and the design method of the GMP workshop, the operating personnel ofthe clean areas can conveniently enter from the upper layer and the lower layer, the number of the labor capacity of the clean areas can be reduced, the unnecessary clean clothes changing area is reduced, and production energy consumption is reduced.

Description

technical field [0001] The invention relates to the field of GMP aseptic purification workshops, in particular to a design method for double vertical penetration layout of GMP workshops and human flow. Background technique [0002] GMP (Good Manufacturing Practice) workshop is a kind of production workshop that can realize internal purification, and it is widely used in many industries, especially in medicine, food and other industries. [0003] On the one hand, the "Good Manufacturing Practice for Drugs (Revised in 2010)" (hereinafter referred to as China GMP) stipulates that "residues of the same intermediate product or raw material drug that are brought into subsequent batches should be strictly controlled. The brought in Residues must not introduce degradation products or microbial contamination, and must not adversely affect the distribution of impurities in raw materials.” Accordingly, it is particularly important to reduce drug residues in equipment and pipelines and ...

AI Technical Summary

Problems solved by technology

In order to meet the basic requirements of the GMP standard, while solving the vertical layout of the logistics required by the GMP workshop, it can further solve the problem of personnel waste caused by the same cleanliness personnel on the upper and lower floors changing clothes separately or the same operator repeatedly changing clothes

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