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Acne-removing, spot-fading and whitening facial mask

A technology for facial mask and spot lightening, which is used in skin care preparations, cosmetics, skin diseases, etc., can solve the problems of long-term use of skin effects, easy breeding of bacteria, inconvenience for users, etc., shortening preparation time, preventing skin acne, Excellent acne removal effect

Inactive Publication Date: 2019-07-02
天津市贝丽丝玛企业管理咨询有限责任公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, the washing mask can nourish the skin for a long time, but because the washing mask usually exists on the skin for a long time, it is easy to breed bacteria, which may cause skin acne, and then cause inconvenience to the user. In terms of shelf life, a certain amount of essence and preservatives are usually added to the mask, and long-term use will also affect the skin

Method used

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  • Acne-removing, spot-fading and whitening facial mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] A facial mask for removing acne, lightening spots and whitening proposed by the present invention comprises the following raw materials in parts by weight: 0.07 parts of hyaluronic acid, 2 parts of butylene glycol, 2 parts of glycerol polyether, 0.03-0.06 parts of polydimethylsiloxane, methyl 0.09 part of chloroisothiamidazolone, 0.12 part of hydroxypropyl guar gum, 0.36 part of collagen, 0.25 part of distearate, 0.06 part of calendula flower extract, 0.06 part of tea tree extract, 0.09 part of honeysuckle flower extract , 0.13 parts of rose essential oil, 0.28 parts of pomegranate essential oil, 0.4 parts of aloe vera essential oil, 2 parts of lemon juice, 0.7 parts of honey, 2 parts of pearl powder, and 52 parts of water;

[0018] Its preparation method comprises the following steps:

[0019] S1. According to 0.07 parts of hyaluronic acid, 2 parts of butylene glycol, 1 to 3 parts of glycerol polyether, 0.03 to 0.06 parts of polydimethylsiloxane, 0.09 parts of methylch...

Embodiment 2

[0024] A facial mask for removing acne, lightening spots and whitening proposed by the present invention comprises the following raw materials in parts by weight: 0.06 parts of hyaluronic acid, 2 parts of butylene glycol, 2 parts of glycerol polyether, 0.05 parts of polydimethylsiloxane, methyl chloride Isothiimazolone 0.1 part, hydroxypropyl guar gum 0.13 part, collagen 0.35 part, distearate 0.26 part, calendula flower extract 0.06 part, tea tree extract 0.06 part, honeysuckle extract 0.1 part, rose 0.15 parts of essential oil, 0.3 parts of pomegranate essential oil, 0.45 parts of aloe vera essential oil, 2 parts of lemon juice, 0.6 parts of honey, 2 parts of pearl powder, 50 parts of water;

[0025] Its preparation method comprises the following steps:

[0026] S1. According to 0.06 parts of hyaluronic acid, 2 parts of butylene glycol, 2 parts of glycerol polyether, 0.05 parts of polydimethylsiloxane, 0.1 part of methyl chloroisothiamidazolone, 0.13 parts of hydroxypropyl gu...

Embodiment 3

[0031]A facial mask for removing acne, lightening spots and whitening proposed by the present invention comprises the following raw materials in parts by weight: 0.058 parts of hyaluronic acid, 2 parts of butylene glycol, 3 parts of glycerol polyether, 0.03 parts of polydimethylsiloxane, methyl chloride Isothiimazolone 0.1 part, hydroxypropyl guar gum 0.12 part, collagen 0.35 part, distearate 0.2 part, calendula flower extract 0.06 part, tea tree extract 0.05 part, honeysuckle extract 0.1 part, rose 0.12 parts of essential oil, 0.23 parts of pomegranate essential oil, 0.35 parts of aloe vera essential oil, 2 parts of lemon juice, 0.6 parts of honey, 2 parts of pearl powder, 48 parts of water;

[0032] Its preparation method comprises the following steps:

[0033] S1. According to 0.058 parts of hyaluronic acid, 2 parts of butylene glycol, 3 parts of glycerol polyether, 0.03 parts of polydimethylsiloxane, 0.1 part of methylchloroisothiamidazolone, 0.12 parts of hydroxypropyl gu...

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Abstract

The invention discloses an acne-removing, spot-fading and whitening facial mask including the following raw materials: hyaluronic acid, butanediol, glycerol polyether, poly(dimethylsiloxane), methyl chloroisothiazolidone, hydroxypropyl guar gum, collagen, distearate, a calendula extract, a tea tree extract, a honeysuckle extract, rose essential oil, red pomegranate essential oil, aloe essential oil, a lemon juice, honey, pearl powder and water. The facial mask disclosed by the invention has excellent acne-removing, spot-fading, nourishing and whitening effects, does not stimulate skin, can effectively prevent bacteria breeding, prevent skin acne, has no addition of flavors or preservatives, is a natural and healthy facial mask, and has the advantages of simple preparation method, high production efficiency, and high mixing uniformity of the product.

Description

technical field [0001] The invention relates to the technical field of cosmetic products, in particular to a facial mask for removing acne, lightening spots and whitening. Background technique [0002] With the growth of age or the change of the environment, a series of problems will appear on the skin, which will plague thousands of beauty lovers, especially women. Therefore, people will adopt different coping methods for different skin problems to repair and maintain damaged skin, so that the skin can reach the state expected by people. In the process of repair and maintenance, mask is one of the most convenient, fastest and most effective beauty products, especially for skin problems caused by environmental factors, mask is usually the first choice of beauty products for users. The three best types of masks currently on the market are sheet masks, washing masks, and brushed masks. Among them, the washing mask can nourish the skin for a long time, but because the washing...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/98A61K8/92A61Q17/00A61Q19/00A61Q19/02A61Q19/08A61P17/10
CPCA61K8/922A61K8/97A61K8/987A61Q17/005A61Q19/00A61Q19/02A61Q19/08
Inventor 刘宇
Owner 天津市贝丽丝玛企业管理咨询有限责任公司
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