Method for preparing imaging element based on two-dimensional germanium selenide photodetector
A technology of photodetector and germanium selenide, which is applied in the direction of electrical components, semiconductor devices, circuits, etc., can solve the problems of large size, unfavorable processing and integration, and increase the cost of imaging equipment, and achieve small size, which is convenient for processing and integration Effect
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[0032] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0033] The invention provides a method for preparing an imaging element based on a two-dimensional germanium selenide photodetector, such as figure 1 As shown, the method includes the following steps:
[0034] Step S101, preparing a two-dimensional germanium selenide single crystal.
[0035] Specifically, the two-dimensional germanium selenide single crystal is grown by vacuum thermal evaporation deposition technology in a dual-temperature-zone tube furnace. °C, the cooling rate is 20 °C / hour.
[0036] Step S102, peeling off the two-dimensional germanium selenide single crystal into two-dimensional germanium selenide nanosheets and transferring them to a silicon wafer substrate with a silicon dioxide oxide layer to obta...
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