Surface anti-fog apparatus and preparation method thereof
An anti-fog and substrate technology, applied in the field of composite materials, can solve problems such as reducing output, increasing traffic accidents, reducing visibility, etc., and achieves the effect of extending service life, preventing blurring, and good bonding strength
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
preparation example Construction
[0016] The preparation method of the surface anti-fog device provided by the invention comprises the following steps:
[0017] Firstly, the base material is etched and ultrasonicated to obtain the etched base material. In this step, place the substrate (2×5cm in size) in the plasma etching chamber, the etching power is 85-95W, the etching time is 3-9min, take it out after etching, and place it in the cleaning chamber. Ultrasonic treatment is performed in the solvent for 8-15 minutes to remove impurities on the surface of the substrate, and finally placed in an oven and dried at a temperature of 90-120°C for 20-30 minutes to remove the ultrasonic cleaning solvent. Keep the surface of the substrate dry to obtain the etched substrate, wherein the substrate is one of glass, polyethylene terephthalate (PET), polypropylene (PP), polyethylene (PE) or a combination of several, the etching gas in the etching chamber is CF 4 , O 2 , HF, used to etch the substrate, ultrasonic cleaning...
Embodiment 1
[0028] Place the glass (2×5cm in size) in the plasma etching chamber, and the etching gas used is CF 4 , the etching power is 90W, take it out after etching for 5min, place it in ethanol and water for ultrasonic treatment, the treatment time is 10min, to remove the residual impurities on the glass surface, and then put it in an oven at 100℃ Dry at high temperature for 20 minutes to obtain the etched glass, place the etched glass in ethanol with a mass fraction of 1% dodecylsilane and immerse it for 24 hours, then take it out and place it in an oven at 100°C for baking Bake for 2 hours, so that the dodecylsilane can fully react with the hydroxyl groups on the glass surface, so as to prepare the surface anti-fog device.
[0029] Wettability test: The contact angle is 155°.
[0030] Anti-fog test: a little water droplets appear after 62s.
Embodiment 2
[0032] Place the glass (2×5cm in size) in the plasma etching chamber, and the etching gas used is CF 4 , the etching power is 90W, take it out after etching for 5min, place it in ethanol and water for ultrasonic treatment, the treatment time is 10min, to remove the residual impurities on the glass surface, and then put it in an oven at 100℃ Dry at high temperature for 20 minutes to obtain the etched glass, place the etched glass in ethanol with a solute mass fraction of 1% heptadecafluoroalkylsilane and immerse it for 24 hours, then take it out and place it in an oven at 100°C Medium-baking for 2 hours, so that the heptadecafluoroalkylsilane can fully react with the hydroxyl groups on the glass surface, so as to prepare the surface anti-fog device.
[0033] Wettability test: The contact angle is 165°.
[0034] Anti-fog test: a little water droplets appear after 85s.
PUM
Property | Measurement | Unit |
---|---|---|
quality score | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com