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Circuit assembly for providing high-frequency energy, and system for generating an electric discharge

A high-frequency energy and circuit technology, applied in the direction of circuits, discharge tubes, irreversible DC power input conversion to AC power output, etc., can solve problems such as inappropriateness, and achieve the effects of space saving, high safety and reliability

Active Publication Date: 2019-05-24
克里斯托夫-赫伯特·迪纳
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This additionally makes this generator unsuitable for use in HF low pressure plasma systems

Method used

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  • Circuit assembly for providing high-frequency energy, and system for generating an electric discharge
  • Circuit assembly for providing high-frequency energy, and system for generating an electric discharge
  • Circuit assembly for providing high-frequency energy, and system for generating an electric discharge

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Embodiment Construction

[0050] Reference is now made to the embodiments of the invention which are illustrated in the accompanying drawings. It should be understood that the embodiments illustrated in the drawings are exemplary only and do not limit the invention per se. Rather, the embodiments are considered only to illustrate possible embodiments of the invention and to enable those skilled in the art to practice the invention. Furthermore, it should be understood that, where necessary, all details encompassed by the scope of the invention may not be set forth in order to provide a concise description of possible embodiments.

[0051] exist figure 1 In , a system 1 is illustrated in a strongly simplified schematic diagram, in particular here as a low-pressure plasma system for processing objects. Such systems can be used, for example, to clean objects made of metal, plastic, glass or ceramics before further processing, such as sputtering, painting, bonding, printing, welding, etc., for Activatio...

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PUM

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Abstract

The invention relates to a circuit assembly (12) for providing high-frequency energy in order to generate an electric discharge in a vacuum chamber (2), in particular in order to generate plasma, having a direct voltage supply (13), a step-up converter circuit (16), and an actuation unit (17). The direct voltage supply (13) provides a direct voltage (Ucc). The step-up converter circuit (16) contains a series circuit consisting of an inductor (18) and an actuatable switch (19), wherein the inductor (18) is connected between a pole (21) of the direct voltage supply (13) and a first electrode (D)of the switch (19). A second electrode (S) of the switch (19) is connected to ground, and the switch (19) additionally has a control electrode (G). The actuation unit (17) is designed to actuate theswitch (19) with a high-frequency in order to generate high-frequency energy with a periodic pulse-like output voltage (UDS) at the first electrode (D) of the switch (19), said output voltage having apeak value which is larger than the value of the direct voltage (Ucc) of the direct voltage supply (13). The high-frequency energy with the output voltage (UDS) is directly output without transformation at an output connection (24) which is designed to directly connect to an electrode (8) of the vacuum chamber (2). The invention likewise relates to a system for generating an electric discharge, in particular a low-pressure plasma system, comprising such a circuit assembly (12).

Description

technical field [0001] The invention relates to a circuit arrangement for supplying high-frequency energy for generating an electrical discharge in a vacuum chamber and to a system for generating an electrical discharge. In particular, the invention relates to a circuit arrangement for providing high-frequency energy to generate plasma and a low-pressure plasma system. Background technique [0002] Low-pressure plasma systems, which are relevant here and operate in the high-frequency (HF) range with an excitation frequency for the plasma of more than 1 MHz, are used, for example, before further processing, such as in Cleaning or activating objects made of metal, plastic, glass and ceramics prior to painting, gluing, printing, welding, etc., for etching or coating by means of plasma, for gas lasers, e.g. CO 2 Laser plasmas are generated and used in many additional applications. [0003] "Techniques and Applications of Plasma Chemistry" by John R. Hollahan and Alexis T. Bell...

Claims

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Application Information

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IPC IPC(8): H01J37/32H05H1/46H02M7/48
CPCH02M3/156H02M7/48H05H1/46H01J37/32174H01J37/32816H05H1/466H05H2242/22H01J2237/335
Inventor 克里斯托夫-赫伯特·迪纳
Owner 克里斯托夫-赫伯特·迪纳
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