Mask plate and preparation method thereof

Abstract

The present invention discloses a mask plate and a preparation method thereof. The invention aims to decrease the area of a gray region formed by exposure. The mask plate provided by the embodiments of the present invention comprises at least one opening region; the side surface of the opening region is a slope forming a set include angle with the upper surface of the mask plate; and an included angle between a tangent at least located at the first portion of the slope and the upper surface is greater than 90 degrees, so that light which enters through the upper surface of the mask plate and is reflected through the first portion can generate a component parallel to a plane where the mask plate is located.

Description

technical field [0001] The present application relates to the field of communication technology, and in particular to a mask and a preparation method thereof. Background technique [0002] Currently, the structure of a liquid crystal display panel mainly includes a thin film transistor (TFT) array substrate (Array), a color filter or color filter substrate (CF), and a liquid crystal layer (LC) arranged between the two substrates. The color film substrate includes: black matrix, color film, flat layer and support column processes, except for the flat layer, all of which need to be exposed. The current mainstream use of color filters is the proximity exposure machine, which requires the use of a photomask. The gap between the photomask and the substrate is usually 100-400 microns (um). Taking the formation of color film as an example, the Mask structure used in the prior art is as follows figure 1 As shown, the side 2 of the Mask opening area 1 is a plane perpendicular to th...

AI Technical Summary

Problems solved by technology

That is, due to the diffraction of light, the spot area that actually passes through the opening of the mask plate to reach the film layer to be exposed is larger, and the pattern size of the final formed color filter is larger than the size of the mask opening area 1, which is not conducive to the fineness of the pattern. It is not conducive to achieving high pixel density (Pixels Per Inch, PPI)

and, if figure 1 As shown, on the other hand, the actual energy of the diffracted part of the light is smaller than that of other areas, which leads to insufficient curing of the edge of the formed color filter pattern, forming a taper angle, and due to the large area of ​​the formed gray area, the taper angle The angle of the color film is small, resulting in poor film thickness uniformity of the pattern of the color film, which will affect the color saturation and contrast of the product

To sum up, using the mask plate in the prior art forms a large gray area in the exposure process, resulting in a large pattern size of the formed film layer and poor film thickness uniformity, which is not conducive to improving the PPI of the display product and affecting product performance.

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