Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for realizing surface planarization of a pit-shaped micro-array structure unit through secondary pressing

A microarray structure and surface flattening technology, applied in the mechanical field, can solve problems such as residual stress, achieve the effects of reducing surface energy, strong realizability, and improving surface processing quality

Active Publication Date: 2019-05-10
JILIN UNIV
View PDF6 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a method for second press-in to realize the flattening of the surface of the pit-shaped microarray structure unit, which overcomes the deficiencies of the surface protrusion of the material and the residual stress inside the material caused by the precision machining of the existing microarray structure. Secondary pressing releases the residual stress existing inside the material, making the surface energy tend to be more stable and achieving the purpose of surface flattening

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for realizing surface planarization of a pit-shaped micro-array structure unit through secondary pressing
  • Method for realizing surface planarization of a pit-shaped micro-array structure unit through secondary pressing
  • Method for realizing surface planarization of a pit-shaped micro-array structure unit through secondary pressing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] The detailed content of the present invention and its specific implementation will be further described below in conjunction with the accompanying drawings.

[0032] see Figure 1 to Figure 7As shown, the method for flattening the surface of the dimple-shaped microarray structural unit by secondary pressing of the present invention is applied to the dimple-shaped microarray structural unit. The operation is simple, the equipment has rich functions, and can be used for large-scale Batch machining. This method simulates the machining process of the pit-shaped microarray structure unit, that is, the Vickers indenter is used to press the surface of the material to form a pit unit with a characteristic size of micron. The formation of bulging phenomenon is accompanied by the existence of residual stress. In order to flatten the surface and reduce the residual stress on the surface, a cube-corner indenter is used to press vertically into the side of the pit unit with a char...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for realizing surface planarization of a pit-shaped micro-array structure unit through secondary pressing, and belongs to the field of machinery. The machining process of the pit-shaped micro-array structure unit is simulated, that is, a Vickers pressure head is pressed into the surface of a material to form a pit unit with the characteristic size being in the micron order, and due to the effect of force borne by the surface of the material, a protruding phenomenon can be formed on the periphery of a pit and exists along with residual stress. In order to flatten the surface and reduce the residual stress of the surface, a cubic angle pressing needle is used for vertically pressing the side faces of the pit units with the feature sizes of micron order to form indentations with the feature sizes of nano order to release the residual stress stored in the material, so that the purpose of flattening the functional surface is achieved. The method provides asurface planarization method for the functional surface of the microarray structure manufactured by the precision machining technology. Operation is easy, equipment functions are rich, and the devicecan be used for large-scale batch machining.

Description

technical field [0001] The invention relates to the mechanical field, in particular to a method for realizing planarization of the surface of a pit-shaped microarray structure unit by secondary pressing. The surface flattening treatment can be carried out on the surface protrusion phenomenon caused by the action of force during the precision machining process of the pit-shaped micro-array mechanism unit. It can provide a planarization method for surface processing of pit-shaped microarray structural units involved in bionic engineering, aerospace, communication engineering and other fields. Background technique [0002] Microstructure functional surface refers to a type of surface with regularly distributed microscopic geometric topological shapes, and its structure size is generally 10−100 μm. Its microscopic geometry is usually in the form of an array, so it is called a microarray structure. Typical microarray structures include pit-shaped arrays, microlens arrays, pyram...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
Inventor 马志超蒋东颖任露泉强振峰马筱溪杜希杰严家琪张红诏卢坊州张微
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products