Light splitter light splitting-based SP simulation lighting super-resolution photoetching lens and device

Abstract

The invention discloses a light splitter light splitting-based SP simulation lighting super-resolution photoetching lens and device, and belongs to the technical field of improvement and innovation ofa super-resolution photoetching lens and device. The device comprises an air purification system, a light source, a light splitter light splitting system, a mask bearing module and a workbench, wherein the air purification system is used for protecting a photoetching device, the light source is used for generating i-line ultraviolet exposure beam, the light splitter light splitting system is usedfor simulating lighting, the mask bearing module is used for bearing a surface plasma imaging device, the workbench is used for bearing a substrate, and the light splitter light splitting system andthe mask bearing module form the SP simulation lighting super-resolution photoetching lens. The device employs a mode of light splitter light splitting, the surface plasma simulation lighting is achieved on the premise of no damage to light field uniformity of the light source, the near-field working distance is improved, the imaging contrast ratio is improved, and super-resolution photoetching isachieved.

Description

technical field [0001] The invention belongs to the technical field of super-resolution lithography, and in particular relates to a spectroscopic-based SP excitation illumination super-resolution lithography lens and device. Background technique [0002] As the size of VLSI continues to shrink, the resolution requirements for lithography devices are getting higher and higher, and traditional lithography devices are completely unable to meet the needs of super-resolution lithography. The surface plasmon lithography device was born under such a background. It uses a long-wavelength exposure light source to excite the surface plasmon wave that maintains the metal structure on the surface plasmon imaging device, and replaces the traditional lithography device with the propagation mode of the plasma wave. The physical propagation mode of light in China has changed the propagation law of electromagnetic waves, and realized high-efficiency and low-cost high-resolution nanolithograp...

AI Technical Summary

Problems solved by technology

[0002] As the size of VLSI continues to shrink, the resolution requirements for lithography devices are getting higher and higher, and traditional lithography devices are completely unable to meet the needs of super-resolution lithography.

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