Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A novel radiation-proof fabric and a production process thereof

A radiation-proof, new type of technology, applied in the direction of layered products, metal layered products, synthetic resin layered products, etc., can solve the problems of poor comfort and weak elasticity of radiation-proof clothing, so as to improve the scope of application, increase the service life, good resilience effect

Inactive Publication Date: 2019-03-29
海宁市华成纺织有限公司
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It can also be seen from this invention that the radiation protection clothing is not only poor in comfort, but also weak in elasticity.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A novel radiation-proof fabric and a production process thereof
  • A novel radiation-proof fabric and a production process thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0028] Such as Figure 1-2 As shown, the novel anti-radiation fabric comprises a base cloth 1, the upper end of the base cloth 1 is provided with an outer liner 2, the lower end of the base cloth 1 is provided with an inner liner 3, and the thickness of the base cloth 1, the outer liner 2 and the inner liner 3 are The ratio is 1:0.8:0.6. Both the base cloth 1 and the outer lining layer 2 and the inner lining layer 3 and the base cloth 1 are compounded by an a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a novel radiation-proof fabric and a production process thereof, and belongs to the technical field of textiles. The fabric includes a base cloth the upper end of which is provided with an outer liner layer, and the lower end of which is provided with an inner liner layer. The base cloth is formed by interweaving first warp and first weft which are perpendicularly crossed toform nodes, and the nodes are provided with gold wires in an up-down crossing and weave manner. The angle between the gold wires and each of the first warp and the first weft is 45 degrees. The outerliner layer is formed by interweaving second warp and second weft which are made of modal fibers. The inner liner layer is formed by interweaving third warp and third weft, wherein the third warp ismade of high-content combed cotton fibers, and the third weft is made of Sorona fibers. The resilience, comfort and range of options for the overall fabric are improved.

Description

technical field [0001] The invention belongs to the technical field of textiles and relates to a novel anti-radiation fabric and its production process. Background technique [0002] With the rapid development of the textile industry, fabrics have also ushered in their new era, and people have higher and higher requirements for modern fabrics, and more and more functional features. Radiation can be seen everywhere around us, whether it is mobile phones, computers, printers for work, microwave ovens, electric blankets, hair dryers, etc. will produce a certain amount of radiation, which is a threat to human health, especially for people with weak resistance. Weak old people and children will be more harmful. In addition, working in a radiation environment for a long time will cause symptoms such as insomnia, dreaminess, and low immunity. Especially for pregnant women, they need to be closely protected against radiation and protect Therefore, there is an urgent need for a high...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B32B23/02B32B23/10B32B27/02B32B27/40B32B27/36B32B15/02B32B9/02B32B9/00B32B37/12D03D13/00D03D15/00D03D15/08D03D15/20D03D15/217D03D15/225D03D15/25D03D15/283D03D15/533D03D15/56
CPCD03D13/002D03D15/00B32B5/024B32B5/08B32B5/26B32B37/1207D03D1/0058D10B2331/04D10B2331/10D10B2201/02D10B2201/22B32B2437/00B32B2307/212B32B2307/726B32B2307/746B32B2262/14B32B2262/103B32B2250/20B32B2262/062B32B2262/04B32B2262/0292B32B2262/0284D03D15/258D03D15/56
Inventor 杨培华
Owner 海宁市华成纺织有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com