zr-cu-al-ti metallic glass films with tunable reflectivity

A technology of zr-cu-al-ti and metallic glass, applied in metal material coating process, sputtering coating, vacuum evaporation coating, etc., can solve the problems of long time consumption, small change range, high cost, etc., and achieve The effect of broad application prospects

Active Publication Date: 2020-10-16
ZHEJIANG UNIV
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Some scholars have previously stated that annealing the metallic glass film below the glass transition temperature can slightly increase the reflectivity of the metallic glass film, but the change is small and takes too long and the cost is too high to meet the needs of actual production.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • zr-cu-al-ti metallic glass films with tunable reflectivity
  • zr-cu-al-ti metallic glass films with tunable reflectivity

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] 1) Zr, Cu, Al, and Ti metal raw materials with a mass purity greater than 98% will be used to synthesize the target, and the nominal proportions of Zr, Cu, Al, and Ti will be 46.5at%, 45at%, 7at%, and 1.5at%, and Placed in a limit vacuum of 6.7×10 -8 On the target position of Pa’s multi-target magnetron sputtering coating equipment, the substrate of the target sputtering film adopts a silicon single-sided polished wafer with a diameter of 25.4 mm, a thickness of 1 mm, and a root mean square roughness of 0.6 nm. The crystal plane direction of the single side of the silicon is (100); the polished side of the silicon single side polished piece is facing down, installed on the substrate holder, and the target is adjusted so that the distance from the target surface to the polished piece is 140 mm.

[0025] 2) Vacuum the cavity of the sputtering chamber of the multi-target magnetron sputtering coating equipment until the pressure in the chamber is 5.0×10 -7 Pa, adjust the s...

Embodiment 2

[0031] 1) Zr, Cu, Al, and Ti metal raw materials with a mass purity greater than 98% will be used to synthesize the target, and the nominal proportions of Zr, Cu, Al, and Ti will be 46.5at%, 45at%, 7at%, and 1.5at%, and Placed in a limit vacuum of 6.7×10 -8 On the target position of Pa’s multi-target magnetron sputtering coating equipment, the substrate of the target sputtering film adopts a silicon single-sided polished wafer with a diameter of 25.4 mm, a thickness of 1 mm, and a root mean square roughness of 0.6 nm. The crystal plane direction of the single side of the silicon is (100); the polished side of the silicon single side polished piece is facing down, installed on the substrate holder, and the target is adjusted so that the distance from the target surface to the polished piece is 140 mm.

[0032] 2) Vacuum the cavity of the sputtering chamber of the multi-target magnetron sputtering coating equipment until the pressure in the chamber is 5.0×10 -7 Pa, adjust the s...

Embodiment 3

[0038] 1) Zr, Cu, Al, and Ti metal raw materials with a mass purity greater than 98% will be used to synthesize the target, and the nominal proportions of Zr, Cu, Al, and Ti will be 46.5at%, 45at%, 7at%, and 1.5at%, and Placed in a limit vacuum of 6.7×10-8 On the target position of Pa’s multi-target magnetron sputtering coating equipment, the substrate of the target sputtering film adopts a silicon single-sided polished wafer with a diameter of 25.4 mm, a thickness of 1 mm, and a root mean square roughness of 0.6 nm. The crystal plane direction of the single side of the silicon is (100); the polished side of the silicon single side polished piece is facing down, installed on the substrate holder, and the target is adjusted so that the distance from the target surface to the polished piece is 140 mm.

[0039] 2) Vacuum the cavity of the sputtering chamber of the multi-target magnetron sputtering coating equipment until the pressure in the chamber is 5.0×10 -7 Pa, adjust the sub...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
thicknessaaaaaaaaaa
surface roughnessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a method for controlling the optical properties of a Zr-Cu-Al-Ti metallic glass film. The method comprises the steps that Zr, Cu, Al and Ti metallic raw materials are synthesized into a target material to be put at a target position of multi-target magnetron sputtering coating equipment; a silicon single-face polishing sheet is adopted as a substrate and installed on a substrate frame, and the distance from the substrate frame to the target position is adjusted; a cavity is vacuumized, the substrate temperature is adjusted to the appropriate temperature, then argon is introduced into the cavity, the air pressure in the cavity is adjusted, and sputtering is conducted for a certain time; the silicon single-face polishing sheet obtained after sputtering is taken out, and the Zr-Cu-Al-Ti metallic glass film with different substrate temperatures is obtained. The prepared metallic glass film with the different substrate temperatures has the distinctly different optical properties in the visible spectrum and especially has the obvious critical temperature, the metallic glass film at the high temperature is high in reflectivity and can serve as a coating material, and the metallic glass film at the low temperature is low in reflectivity and can serve as a good light absorption material. The metallic glass film can be applied to the fields of optical windows, micro electro-mechanical systems, microscopes and solar cells and has the wide application prospect by serving as a functional element.

Description

technical field [0001] The invention relates to a metallic glass film, in particular to a Zr-Cu-Al-Ti metallic glass film with adjustable reflectivity properties. Background technique [0002] In the 1860s, amorphous alloys, that is, metallic glasses, came into people's field of vision. Due to their unique structure and excellent performance different from traditional crystalline alloys, metallic glasses have attracted extensive attention from scientific researchers. In the past thirty years, the research and development of bulk metallic glasses has been very vigorous, but shear bands are very easy to appear when metallic glasses are deformed, and the concentrated deformation leads to material failure. However, when the size of metallic glasses is reduced to nanoscale, such as metallic glass films, the deformation mode is very easy to transform into uniform deformation, and the thermodynamics and other aspects will appear completely different from the size effect of bulk met...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/18C23C14/35
CPCC23C14/185C23C14/35
Inventor 蒋建中孙丽娟曹庆平张冬仙王晓东
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap