Shadow mask for oled evaporation and manufacturing method thereof, oled panel manufacturing method
A manufacturing method and shadow mask technology, which are applied in the field of OLED evaporation, can solve the problems of low aperture ratio, inability to meet the requirements of small-sized and high-resolution OLED panels, and increase the limit size of sub-pixels, etc., to achieve high mechanical stability, High mechanical stability, mechanical strength, and high corrosion resistance, high mechanical strength, and high corrosion resistance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0050] As mentioned in the background art, existing OLED panels formed by vapor deposition have the problems that the limit size of sub-pixels (light-emitting units) is still enlarged, and the aperture ratio is still low, which cannot meet the requirements of small-sized and high-resolution OLED panels.
[0051] A study of the existing evaporation process found that the size and shape of the openings in the existing metal shadow mask limit the size and aperture ratio of the sub-pixels (light-emitting units) formed by evaporation, that is, in the existing metal shadow mask The size of the opening is still large, so that the sub-pixels (light-emitting units) formed by evaporation using the metal shadow mask are still large, and the shape of the existing metal shadow mask is difficult to guarantee, thus affecting the pixel (light-emitting unit) formed by evaporation. The shape of the unit) affects the aperture ratio.
[0052] Further studies have found that the specific formation...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
surface roughness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com