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A method for preparing rhenium pentachloride

A rhenium pentachloride and chlorine gas technology, applied in chemical instruments and methods, rhenium compounds, inorganic chemistry, etc., can solve problems such as low purity, potential safety hazards of chlorine gas, and no devices and methods for rhenium pentachloride

Active Publication Date: 2021-02-09
AEROSPACE RES INST OF MATERIAL & PROCESSING TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] There is no standardized device and method for the preparation of existing rhenium pentachloride, and the chlorine gas in the preparation process may cause safety hazards
In addition, the purity of the prepared rhenium pentachloride is lower than 90%, and there is no protective gas to prevent the deliquescence of rhenium pentachloride, which in turn affects the purity of the subsequent rhenium layer preparation

Method used

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  • A method for preparing rhenium pentachloride
  • A method for preparing rhenium pentachloride

Examples

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preparation example Construction

[0072] The invention proposes a high-purity metal chloride preparation device, which adopts the method of high-temperature direct chlorination of metal powder to obtain high-purity metal chloride. The device includes a chlorine gas input system, an inert gas input system, a metal chlorination reaction system, a chloride purification system, a chloride collection bottle, a vacuum system, and a control cabinet. Among them, the metal chlorination reaction system can be independently heated and kept at a certain temperature range during the chlorination process; the chloride purification system can be independently heated and kept at a certain temperature range during the sublimation and purification process; the chloride collection bottle adopts circulating water During the chlorination process, the input amount of chlorine gas is controlled by adjusting the chlorine gas pressure reducing valve to make the air bag expand moderately; the vacuum pump is protected by a liquid nitroge...

Embodiment 1

[0097] like figure 1 As shown, a device for preparing rhenium pentachloride, the device includes a nitrogen gas cylinder, a chlorine gas cylinder, a vacuum pump, an exhaust gas treatment device, a quartz tube furnace, a quartz sublimation furnace, a collection bottle 1 and a collection bottle 2;

[0098] Storing nitrogen in the nitrogen cylinder;

[0099] Store chlorine in the described chlorine cylinder;

[0100] The collection bottle 1 and the collection bottle 2 are cooled by circulating water;

[0101] Metal rhenium powder is placed in the quartz tube furnace, 3 / 4 of the length of the quartz tube in the quartz tube furnace is placed in the resistance furnace, 1 / 4 of the length is placed outside the resistance furnace, and the quartz tube is energized through the resistance furnace for heating;

[0102] The quartz sublimation furnace is heated by electric resistance;

[0103] The tail gas treatment device is used to process unreacted chlorine, and the treatment method a...

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Abstract

The invention relates to a method for preparing rhenium pentachloride. The method is simple, and the prepared rhenium pentachloride has high purity. The invention belongs to the technical field of precursors for engine thrust chambers. The rhenium pentachloride prepared by utilizing the method has high purity of more than 99.9%. The preparation method is high, and the repeatability is high. The prepared rhenium pentachloride is stored by adopting nitrogen protection and conveniently sequentially serves as a precursor for performing chemical vapor deposition so as to prepare the high-purity metal rhenium layer. The input quantity of chlorine is reasonable and controllable in the preparation process, the reaction utilization rate is high, and reaction tail gases are reduced.

Description

technical field [0001] The invention relates to a method for preparing rhenium pentachloride. The method is simple, and the prepared rhenium pentachloride has high purity, and belongs to the technical field of precursors for preparing engine thrust chambers. Background technique [0002] The orbit / attitude control engine is mainly used in the orbit or attitude control of space vehicles and strategic and tactical weapons. The combustion temperature of the fuel in the thrust chamber is as high as 2700°C, and the inner wall temperature is still higher than 1000°C with the active liquid film cooling technology on the inner wall. In order to meet the high temperature strength requirements of the engine thrust chamber, refractory metals (W, Mo, Ta, Nb, Re, etc.) or metal platinum must be used as the thrust chamber body material. However, the high temperature oxidation resistance of these materials is poor, so it is necessary to coat the surface of the body material with a high tem...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01G47/00C23C16/14
CPCC01G47/00C23C16/14
Inventor 闫旭波徐方涛李海庆张绪虎
Owner AEROSPACE RES INST OF MATERIAL & PROCESSING TECH
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