Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A Refractive Index Sensing Method Based on Dual Surface Plasmon Resonance

A refractive index sensor and refractive index technology are applied in the measurement of scattering characteristics, the measurement of phase influence characteristics, instruments, etc., and can solve the problem that the sensitivity of refractive index sensing needs to be further improved.

Active Publication Date: 2020-07-07
JIANGNAN UNIV
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the sensitivity of refractive index sensing needs to be further improved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Refractive Index Sensing Method Based on Dual Surface Plasmon Resonance
  • A Refractive Index Sensing Method Based on Dual Surface Plasmon Resonance
  • A Refractive Index Sensing Method Based on Dual Surface Plasmon Resonance

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] This embodiment provides a grating, the grating has a metal-dielectric composite structure, such as figure 1 Shown:

[0037] The top and bottom of the dielectric grating layer are respectively covered with a thickness h 1 and h 2 thin metal layer; where: Λ is the grating period, f is the grating fill factor, d g is the ridge depth of the dielectric grating, d h is the thickness of the dielectric film, and the relative permittivity of the dielectric material is ε d , the relative permittivity of the substrate material is ε s , the relative permittivity of the metal material is ε m . In this embodiment, the material of the metal layer is Ag as an example for illustration.

[0038] For TM polarization, to excite surface plasmon resonance at the metal-dielectric interface, the propagation constant β satisfies:

[0039]

[0040] In formula (1), k 0 =2π / λ is the incident wave vector, and λ is the wavelength of the incident light.

[0041] Under this condition, fo...

Embodiment 2

[0055] This embodiment provides a method for realizing refractive index sensing based on dual surface plasmon resonance, and the method is applied to a high-sensitivity biosensor designed using a metal-dielectric composite structure grating;

[0056] A metal-dielectric composite structure grating is used to design a high-sensitivity biosensor. The sensor is composed of a thin metal layer covered above and below the grating layer of the dielectric grating. For TM polarized light, the grating is used to provide wave vector matching, and the surface is excited at the metal-medium interface. Plasmon resonance: using the double surface plasmon resonance formed by the ridge of the dielectric grating and its upper and lower metal interfaces, it causes the high localization of the light field energy and the significant enhancement of the light absorption rate, resulting in a sharp decrease in the reflected light energy, forming a reflection in the broadband high reflection spectrum Val...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
relative permittivityaaaaaaaaaa
relative permittivityaaaaaaaaaa
Login to View More

Abstract

The invention discloses a refractive index sensing method based on double surface plasma resonance, and belongs to the field of micro electro mechanical systems. A metal-dielectric composite structureis formed by covering the upper and lower sides of a grating layer with thin metal layers, wave vector matching is provided by a grating for TM polarized light, and surface plasma resonance is excited on a metal-dielectric interface; by means of double surface plasma resonance formed between a dielectric grating ridge and upper and lower metal interfaces of the dielectric grating ridge, high localization and resonance absorption enhancement of light field energy are realized, reflected light energy is reduced sharply, and a reflection valley is formed in a broadband high reflection spectrum.The reflection valley can be driven to move remarkably by small change of refractive index of external environment, and different analyte samples are recognized by monitoring movement of the reflection valley in the reflection spectrum.

Description

technical field [0001] The invention relates to a method for realizing refractive index sensing based on double surface plasmon resonance, and belongs to the technical field of optical fiber sensors. Background technique [0002] Surface plasmon resonance is an excited state localized at the metal-dielectric interface through the interaction of free electrons and photons. In this interaction, incident light waves cause electrons with the same resonant frequency at the metal interface to collectively oscillate, forming surface plasmon resonance. Optical devices based on surface plasmon resonance can manipulate photon transmission at the micro- and nano-scale, and are expected to realize the perfect combination of photonics and electronics at the micro-nano scale. They are extremely useful in the fields of physics, optics, material science, and information science. Application value has become a focus of attention in recent years. [0003] Based on the surface plasmon resona...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/41G01N21/552
CPCG01N21/41G01N21/4133G01N21/55G01N21/554G01N2201/088
Inventor 桑田王啦尹欣齐红龙王跃科王继成
Owner JIANGNAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products