Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Essence for removing stretch marks and scars

A technology for essence and stretch marks, applied in skin care preparations, cosmetics, cosmetic preparations, etc., can solve problems such as unsatisfactory effects, achieve safe and non-toxic side effects, remove stretch marks, and restore the physiological function of the skin. Effect

Inactive Publication Date: 2018-12-11
东莞市卫花生物科技有限公司
View PDF5 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] For this reason, the present invention provides a kind of essence that removes stretch mark and scar, in order to overcome the problem of unsatisfactory effect in the prior art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] An essence for removing stretch marks and scars, comprising by weight: 8 parts of butanediol, 2 parts of collagen, 0.05 parts of hyaluronic acid, 1 part of centella asiatica extract, 3 parts of dextrin, and 3 parts of peony extract , European linden flower extract 1 part, marshmallow root extract 2 parts, arnica flower extract 3 parts, oligopeptide-1, 1 part, oligopeptide-2, 3 parts, oligopeptide-5, 3 parts, Oligopeptide-6, 1 part, 1 part of glycerin and 100 parts of deionized water.

[0015] Put centella asiatica extract, peony extract, linden flower extract, marshmallow extract and arnica flower extract into the same container and stir evenly, then add butanediol, collagen, hyaluronic acid, dextrin , oligopeptide-1, oligopeptide-2, oligopeptide-5, oligopeptide-6, and glycerol were stirred for 30 minutes, sealed and left for 35 hours, added deionized water to adjust, and then divided into vials.

Embodiment 2

[0017] An essence for removing stretch marks and scars, characterized in that it comprises, by weight: 10 parts of butanediol, 4 parts of collagen, 2.55 parts of hyaluronic acid, 5 parts of centella asiatica extract, 5 parts of dextrin, peony Extract 6 parts, European linden flower extract 3 parts, marshmallow root extract 5 parts, arnica flower extract 6 parts, oligopeptide-1, 2 parts, oligopeptide-2, 6 parts, oligopeptide-5 , 5 parts, oligopeptide-6, 3 parts, 3 parts of glycerin and 100 parts of deionized water.

[0018] Put centella asiatica extract, peony extract, linden flower extract, marshmallow extract and arnica flower extract into the same container and stir evenly, then add butanediol, collagen, hyaluronic acid, dextrin , oligopeptide-1, oligopeptide-2, oligopeptide-5, oligopeptide-6, and glycerol were stirred for 30 minutes, sealed and left for 40 hours, added deionized water to adjust, and then divided into vials.

Embodiment 3

[0020] An essence for removing stretch marks and scars, characterized in that it comprises, by weight: 8.25 parts of butanediol, 2.35 parts of collagen, 0.055 parts of hyaluronic acid, 1.75 parts of centella asiatica extract, 3.15 parts of dextrin, peony Extract 3.25 parts, European linden flower extract 1.45 parts, marshmallow root extract 2.25 parts, arnica flower extract 3.15 parts, oligopeptide-1, 1.15 parts, oligopeptide-2, 3.25 parts, oligopeptide-5 , 3.15 parts, oligopeptide-6, 1.15 parts, 1.5 parts of glycerin and 100 parts of deionized water.

[0021] Put centella asiatica extract, peony extract, linden flower extract, marshmallow extract and arnica flower extract into the same container and stir evenly, then add butanediol, collagen, hyaluronic acid, dextrin , oligopeptide-1, oligopeptide-2, oligopeptide-5, oligopeptide-6, and glycerol were stirred for 30 minutes, sealed and left for 35 hours, added deionized water to adjust, and then divided into vials.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to essence for removing stretch marks and scars. The essence is prepared by mixing the components of 8-10 parts of butylene glycol, 2-4 parts of collagen, 0.05-2.55 parts of hyaluronic acid, 1-5 parts of herba centellae extracts, 3-5 parts of dextrin, 3-6 parts of radix paeoniae extracts, 1-3 parts of tilia europaea flower extracts, 2-5 parts of althaea officinalis root extracts, 3-6 parts of arnica Montana flower extracts, 1-2 parts of oligopeptide-1, 3-6 parts of oligopeptide-2, 3-5 parts of oligopeptide-5, 1-3 parts of oligopeptide-6, 1-5 parts of glycerol and 100 parts of deionized water. After using the essence, the moisture content of the skin is obviously increased, and the effect of removing the stretch marks and the scars of the essence is more significant than that of general products; and the lasting moisturizing effect can be achieved, the elasticity of the skin is obviously improved, and with the increase of the use time, the smoothness of the skin can be obviously improved step by step. The used raw materials mainly come from flowers, leaves, roots, stems and fruits of plants, so that the essence is safe and free of toxic and side effects.

Description

technical field [0001] The invention relates to the technical field of skin care products, in particular to an essence for removing stretch marks and scars. Background technique [0002] The formation of stretch marks is mainly due to the influence of pregnancy hormones, combined with the swelling of the abdomen, which damages or breaks the elastic fibers and collagen fibers of the skin, and the skin of the abdomen becomes thinner, and some pink or purple-red waves of different widths and lengths appear. pattern. After childbirth, these patterns will gradually disappear, leaving white or silvery white shiny scar lines, that is, stretch marks. Stretch marks mainly appear on the abdominal wall, and may also appear on the inner and outer thighs, buttocks, chest, lower back and arms. Primipara is the most obvious, which has seriously affected the postpartum posture and physical and mental health of women. At present, the common methods for removing stretch marks include: esse...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/73A61K8/65A61K8/64A61K8/34A61Q19/08A61Q19/00
CPCA61K8/345A61K8/64A61K8/65A61K8/732A61K8/735A61K8/9789A61Q19/00A61Q19/08
Inventor 邓乾文
Owner 东莞市卫花生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com