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A photolithographic system for fabricating parallel and equidistant stripe holographic gratings

A technology of holographic grating and photolithography system, which is applied in the direction of diffraction grating, microlithography exposure equipment, photolithography exposure device, etc., and can solve the problems of poor parallelism of exposure beams and other problems

Active Publication Date: 2020-06-16
SUZHOU UNIV
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  • Abstract
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  • Application Information

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Problems solved by technology

[0003] In order to solve the technical problem of poor parallelism of exposure light beams when making parallel and equally spaced striped holographic gratings, the technical solution of the present invention is as follows:

Method used

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  • A photolithographic system for fabricating parallel and equidistant stripe holographic gratings
  • A photolithographic system for fabricating parallel and equidistant stripe holographic gratings
  • A photolithographic system for fabricating parallel and equidistant stripe holographic gratings

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Embodiment Construction

[0023] The present invention will be further described below in conjunction with accompanying drawing:

[0024] A photolithographic system for making parallel and equidistant striped holographic gratings, the photolithographic system is used to manufacture parallel and equidistant striped holographic gratings; the photolithographic system is as follows figure 1 As shown, it includes a coherent light source 1, a beam splitter 2, a first mirror 3, a second mirror 4, a first aperture 5, a second aperture 6, a first pinhole filter 7, and a second pinhole filter 8, the first collimating lens 9, the second collimating lens 10; the first volume Bragg grating 13, the second volume Bragg grating 16, the first photodetector 14, the second photodetector 15;

[0025] The light emitted by the coherent light source is divided into the transmitted light path and the reflected light path after passing through the beam splitter; the first mirror, the first diaphragm, the first pinhole filter,...

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Abstract

The invention belongs to the field of information optics and relates to a lithography system for fabricating a parallel equidistant stripe holographic grating to solve the poor parallelism of exposurebeams when a parallel equidistant stripe holographic grating is fabricated. A volume Bragg grating-1 grade transmission diffraction efficiency is used as a criterion for parallel light so as to accurately determine the distance between a pinhole filter and a collimating lens and accurately place the pinhole of the pinhole filter on the object-side focal point of the collimating lens, thereby achieving the collimation of an interference optical path. In addition, the system helps to achieve the real-time monitoring of the parallelism of the exposure beam, and can also lock the parallel light in cooperation with a PZT translation table, thereby improving the shooting quality of the parallel equidistant stripe holographic grating.

Description

technical field [0001] The invention belongs to the technical field of information optics and relates to a photolithography system for photographing holographic gratings. Background technique [0002] Plane-parallel equidistant stripe holographic grating is an important diffractive optical element, widely used in spectrometer, optical communication, optical metrology, strong laser system, etc. This type of grating also puts forward strict requirements on the parallelism of the grating stripes, and the poor parallelism of the recording light directly affects the wave aberration of the grating. Therefore, the self-collimation of the parallel light for recording the holographic grating is better. The optical device of the collimating optical path generally uses an aspheric lens or an off-axis parabolic mirror to self-collimate to obtain parallel light. The common detection methods for the collimation of holographic optical path include Moire fringe method and standard referen...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G02B5/32G03F7/20
CPCG02B5/1857G02B5/32G03F7/7055
Inventor 邹文龙李朝明吴建宏陈新荣蔡志坚刘全
Owner SUZHOU UNIV
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