Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Steam purification production line in production of diketene

The technology of diketene and production line is applied in the fields of acetic acid impurity removal evaporation equipment and diketene production line, which can solve the problems of furnace tube scaling, equipment damage, adverse effects of cracking reaction, etc.

Active Publication Date: 2018-11-06
QINGDAO DOUBLE PEACH SPECIALTY CHEM GRP +1
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, acetic acid will enrich solid impurities and soluble impurities in the process of repeated mechanical application, and will enter the cracking furnace tube during the evaporation process, resulting in fouling of the furnace tube and damage to the equipment
Moreover, acetic acid vapor will inevitably entrain a certain amount of liquid phase after flowing out from the gasification equipment, which will cause adverse effects on the cracking reaction

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Steam purification production line in production of diketene
  • Steam purification production line in production of diketene
  • Steam purification production line in production of diketene

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0127] Such as figure 1 , figure 2 As shown, in the acetic acid steam impurity removal production line described in this embodiment, the body 1 includes a first body 11 and a second body 12 communicated inside, and the primary impurity removal device is arranged inside the second body 12 . The second body 12 is disposed above the first body 11 .

[0128] Furthermore, in the acetic acid steam impurity removal production line in this embodiment, the feeding device 3 is arranged on the first body 11 . The feeding device 3 is arranged at one end of the first body 11 .

[0129] Furthermore, in the acetic acid steam impurity removal production line in this embodiment, the discharge device 4 is arranged on the second body 12 . The discharge device 4 is disposed at the end of the second body 12 opposite to the connection position of the first body 11 .

[0130] Furthermore, in the acetic acid steam impurity removal production line in this embodiment, its primary impurity removal ...

Embodiment 2

[0133] Such as figure 1 , figure 2 As shown, the difference between the acetic acid steam impurity removal production line described in this embodiment and the above embodiments is that the primary impurity removal device includes a first impurity removal device 21 and a second impurity removal device 22 at different locations. The first impurity removal device 21 is used to remove the raw material acetic acid and / or the solid impurities generated when the acetic acid is vaporized, and the second impurity removal device 22 is used to remove the raw material acetic acid and / or the liquid and / or foamy impurities generated when the acetic acid is vaporized.

[0134] Further, the distance between the second impurity removal device 22 and the discharge device 4 is smaller than the distance between the first impurity removal device 22 and the discharge device 4 .

[0135] Through the steam impurity removal production line in diketene production introduced in this example, the prim...

Embodiment 3

[0138] Such as figure 1 , figure 2 As shown, the difference between the acetic acid steam impurity removal production line described in this embodiment and the above-mentioned embodiments is: the acetic acid steam impurity removal production line, its first impurity removal device 21 includes a support part 211 and a first removal device arranged on the support part 211 The miscellaneous function part 212, the support part 211 is connected with the main body 1, and the first miscellaneous function part is arranged above the support part. The first impurity removal function part includes an impurity removal filler, and the impurity removal filler is an acid-resistant material. Preferably, the impurity removal filler is made of S31603 stainless steel. More preferably, the size of the impurity removal filler is Ф40mm. The filling method of the impurity-removing filler is random pile.

[0139] Further, the second impurity removal device 22 of the acetic acid steam impurity remo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a steam purification production line in the production of diketene. The production line comprises: an acetic acid purification evaporation device for converting a raw materialacetic acid into acetic acid vapor, and a purification device for removing impurities produced / carried in the acetic acid vapor production and acetic acid vapor transportation. The purification devicecomprises a primary purification device and a secondary purification device. The primary purification device is arranged in the acetic acid purification evaporation device. The secondary purificationdevice is arranged outside the acetic acid purification evaporation device and is connected to the acetic acid purification evaporation device. The interior of the acetic acid purification evaporation device and the interior of the secondary purification device form a channel for flowing acetic acid vapor. The vapor purification production line in the diketene production can timely and effectively remove various impurities in acetic acid gas before entering the cracking equipment in stages according to types and facilitate impurity recovery in the later stage.

Description

technical field [0001] The invention belongs to the field of diketene production equipment, and in particular relates to an acetic acid impurity-removing evaporation equipment and a diketene production line in the production of diketene. Background technique [0002] Diketene, also known as acetylketene, is an important fine chemical intermediate. Because its molecular structure contains two double bonds, its chemical properties are very active, and its application fields continue to expand. Diketene and its intermediate product ketene can be used to synthesize a variety of important fine chemicals such as dyes, medicines, pesticides and sweeteners such as A-K sugars. In recent years, due to the continuous increase in the development of downstream products and the continuous increase in consumption, the market situation of diketene is in good shape, and the price keeps rising. The new and expanded facilities of diketene in China are developing rapidly. It is an inevitable r...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B01D1/00B01D1/30C07C51/42C07C51/43C07C53/08
CPCB01D1/00B01D1/30C07C51/42C07C51/43C07C53/08
Inventor 李斌孙善起韩娟王超郑越晴
Owner QINGDAO DOUBLE PEACH SPECIALTY CHEM GRP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com