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A photovoltaic glass anti-reflection film

A technology of photovoltaic glass and anti-reflection film, applied in the coating and other directions, can solve the problems of narrow spectrum of anti-reflection film and increase the length of the coating production line, achieve good color neutrality, increase the length of the production line and increase the material and production cost, good compatibility

Active Publication Date: 2021-03-02
宁波纳诺特新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Compared with the photovoltaic glass chemical coating technology currently used in the industry, the adoption of physical vapor deposition technology will undoubtedly further improve the strength and reliability of photovoltaic anti-reflection coatings, and obtain better color neutrality, but for the current anti-reflection coatings of physical vapor deposition Due to the problem of narrow spectrum, it is urgent to invent a multi-layer film structure with good color neutrality and broadband anti-reflection characteristics at 300-1200 nanometers, while ensuring that the length of the physical vapor deposition coating production line does not increase significantly and ensures that the coating material is compatible with tempered glass. Process Compatibility and Matching

Method used

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  • A photovoltaic glass anti-reflection film
  • A photovoltaic glass anti-reflection film
  • A photovoltaic glass anti-reflection film

Examples

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Embodiment 1

[0027] The photovoltaic glass anti-reflection film of embodiment 1, such as figure 1 As shown, it includes a glass substrate 10 and an anti-reflection film compounded on the surface of the glass substrate 10. The glass substrate 10 is ultra-white low-iron glass, and the anti-reflection film is a multilayer film prepared by reactive DC magnetron sputtering deposition. Layers of films are sequentially stacked on the surface of the glass substrate 10 from the inside to the outside, wherein the first layer 21 is Al 2 o 3 coating, the second layer 22 is SiO 2 coating, the third layer 23 is Al 2 o 3 coating, the fourth layer 24 is TiO 2 coating, the fifth layer 25 is SiO 2 coating, the sixth layer 26 is TiO 2 coating, the seventh layer 27 is SiO 2 plating.

[0028] In embodiment 1, the Al of the first layer 21 2 o 3 The thickness of the coating is 15nm, the second layer 22 of SiO 2 The thickness of the coating is 25nm, the Al of the third layer 23 2 o 3 The thickness of...

Embodiment 2

[0032] The difference between the photovoltaic glass antireflection film of embodiment 2 and embodiment 1 is that in embodiment 2, the glass substrate 10 is patterned glass, and the antireflection film is prepared on the patterned glass 10 by radio frequency magnetron sputtering, and ZnO coating instead of Al 2 o 3 Plating, with Nb 2 o 5 Coating instead of TiO 2 plating.

[0033] In Example 2, the monomolecular hydrophobic functional layer 30 was prepared on the surface of the antireflection film by vapor deposition of hexamethyldisilazane.

[0034] In embodiment 2, the thickness of the ZnO plating layer of the first layer 21 is 10nm, the SiO of the second layer 22 2 The thickness of the coating is 25nm, the thickness of the ZnO coating of the third layer 23 is 70nm, the Nb of the fourth layer 24 2 o 5 The thickness of the coating is 110nm, the fifth layer is 25 SiO 2 The thickness of the coating is 30nm, the sixth layer of 26 Nb 2 o 5 The thickness of the coating is...

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Abstract

The invention discloses a photovoltaic glass antireflection film, which comprises a glass substrate and an antireflection film compounded on the surface of the glass substrate. The glass substrate is embossed glass or ultra-white low-iron glass, and the antireflection film is made by physical vapor deposition. multilayer film, the multilayer film is laminated on the surface of the glass substrate from the inside to the outside, in which the first layer is Al 2 o 3 coating, the second layer is SiO 2 coating, the third layer is Al 2 o 3 coating, the fourth layer is TiO 2 coating, the fifth layer is SiO 2 coating, the sixth layer is TiO 2 coating, the seventh layer is SiO 2 Coating; the photovoltaic glass anti-reflection coating does not significantly increase the length of the physical vapor deposition coating production line and the cost of materials and production. It has an anti-reflection effect in the wavelength range of 300-1200 nanometers. The average transmittance is higher than 94%; under the condition of vertical incidence, the color neutrality is good, and the anti-reflection coating is closer to the original color of ultra-white glass than the chemical coating, and it has good compatibility with the subsequent glass tempering process.

Description

technical field [0001] The invention belongs to the technical field of anti-reflection film and its preparation, and in particular relates to an anti-reflection film for photovoltaic glass. Background technique [0002] Photovoltaic glass anti-reflection film not only needs to have high optical transmittance, but also needs to have excellent mechanical properties and weather resistance. At present, the sol-gel method is widely used to prepare SiO with certain porosity by roller coating, pulling, spin coating or spray coating. 2 AR coating. Usually, the refractive index of this kind of anti-reflection film prepared by chemical wet method is relatively close to the ideal refractive index of 1.23 of a single-layer anti-reflection film in the visible light and near-infrared bands (about 300-1200 nm wavelength range), so it can be used in this band. Obtain a higher solar spectrum weighted average transmittance. Although, various SiO 2 Nanoparticles (solid, mesoporous, core-sh...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/42C03C17/34C03C17/36
CPCC03C17/006C03C17/3417C03C17/3435C03C17/3452C03C17/36C03C17/3618C03C17/3644C03C17/3649C03C17/366C03C17/42C03C2217/425C03C2217/734C03C2218/152C03C2218/156
Inventor 不公告发明人
Owner 宁波纳诺特新材料科技有限公司
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