A kind of preparation method of anti-reflection film for three-junction solar cell for flexible space

Abstract

Disclosed is a preparation method of a three-junction solar cell antireflection film used for flexible space. In a normal temperature, the antireflection film is deposited on the surface of the solarcell by a combination of an electron beam thermal evaporation method and an ion source auxiliary deposition method; the ion source is a Mark II type hall ion source; and the hall ion source is 150-180V in positive electrode acceleration voltage and 5-6A in auxiliary particle beam. The preparation method has the beneficial effects of performing flexible solar cell antireflection film deposition inthe normal temperature, and ensuring that the antireflection film can satisfy the requirement of refractive index and has enough adhesion degree; and baking and heating are not needed, the operation steps of heating and cooling are omitted, and the production efficiency of the solar cell is improved.

Description

Technical field [0001] This application belongs to the technical field of optical film preparation, and specifically relates to a method for preparing an anti-reflection film for a triple junction solar cell for flexible space. Background technique [0002] The inversely grown lattice mismatched triple junction (IMM-3J) solar cell for flexible space is a new type of solar cell whose epitaxial structure is InGaP / GaAs / InGaAs, and the highest photoelectric conversion efficiency can reach 33%. This kind of solar cell needs to use MOCVD technology to complete the growth of each epitaxial layer in the order of InGaP, GaAs, InGaAs on a GaAs substrate, and then use semiconductor bonding technology to combine the outermost InGaAs epitaxial layer with the flexible metal layer Finally, the initial GaAs substrate is completely etched using wet etching technology to obtain a flexible epitaxial layer attached to the metal layer. The flexible epitaxial layer can be processed into flexible sola...

AI Technical Summary

Problems solved by technology

The technical content involved in this patent cannot solve the technical problems mentioned above, mainly for the following reasons: 1. The main method of depositing the anti-reflection film of space solar cells is the electron beam thermal evaporation method, which is similar to that of intermediate frequency in terms of principle and operation. Magnetron sputtering makes a big difference

2. Since the ion source is divided into Hall ion source and Kaufman ion source, the patent does not specify the type and parameters of the ion source used, so the ion source parameters provided have no clear guiding significance

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