Tremella polysaccharide high-moisturized facial mask essence and facial mask as well as preparation method thereof

Abstract

The invention relates to tremella polysaccharide-containing high-moisturized facial mask essence and a facial mask as well as a preparation method thereof. The tremella polysaccharide-containing high-moisturized facial mask essence is prepared from the following components in percentage by mass: 0.1 to 2 percent of tremella polysaccharide, 0.1 to 0.5 percent of a camellia sinensis leaf extract, 2to 4 percent of an aloe barbadensis extract, 1 to 2 percent of a hamamelis virginiana extract, 8.45 to 30.6 percent of an auxiliary material and the balance of water. The essence disclosed by the invention takes the tremella polysaccharide as a main moisturizing, moisture holding and moisture retention agent, and then the tremella polysaccharide is combined with the aloe barbadensis extract for cooperative moisturization; the hamamelis virginiana extract can effectively improve and protect the skin barrier, and the camellia sinensis leaf extract can effectively promote the skin to produce surplus free radicals, so as to cooperatively enhance the skin moisturizing effect. The formula disclosed by the invention is safe and nonirritant.

Description

technical field [0001] The invention relates to a high moisturizing facial mask essence and a facial mask, in particular to a high moisturizing facial mask essence containing tremella polysaccharide, a facial mask and a preparation method thereof. Background technique [0002] According to the market survey report of AC Nielsen, in 2012, the sales volume of China's mask market reached 7.85 billion yuan, a year-on-year increase of 33%, among which moisturizing and whitening masks are the largest consumer demand point. [0003] Studies have shown that lack of water in the skin can easily lead to an imbalance of water and oil in the skin, forming a skin that is oily on the outside and dry on the inside, especially on the face. It is easy to be sensitive, red bloodshot, etc. caused by external stimuli, which will lead to a series of problems such as acne, fine lines, wrinkles, dullness, pigmentation, and desquamation on the skin. In addition, the degree of dehydration on the sk...

AI Technical Summary

Problems solved by technology

[0004] At present, moisturizers include polyols, hyaluronic acid, sodium pyrrolidone carboxylate, ceramides, etc., but there are the following disadvantages: polyols only absorb moisture in the air to achieve the effect of moisturizing the surface, but cannot form a protective film and The role of deep hydration; hyaluronic acid only moisturizes the surface of the skin, and cannot penetrate the cutin of the epidermis, so it cannot form an effective hydrating, water-retaining and water-locking effect

For example, patent CN201110263571.0 discloses a natural long-lasting moisturizing essence with high hydration degree and obvious long-term effect; , the above patents only improve skin moisturizing ability from a single moisturizing perspective, while ignoring the influence of skin barrier and free radicals on skin moisturizing

In addition, most of the existing commercially available mask essences or skin care products with moisturizing and whitening effects are added with chemical preservatives (such as methylisothiazolinone, parabens, etc.), which may irritate the skin if used for a long time. trigger skin inflammation

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