Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method for preparing silicon-containing polyurea monodisperse microspheres with high yield by precipitation polymerization

A monodisperse microsphere, high-yield technology, applied in the preparation of microspheres, microcapsule preparations, etc., can solve the problems of low preparation efficiency and difficulty in realizing industrial-scale production, and achieve the effects of simple steps, efficient preparation, and improved efficiency

Inactive Publication Date: 2021-01-05
UNIV OF JINAN
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

According to the monomer consumption of 6.0% and the microsphere yield of 70%, a ton of reactor can only obtain about 42Kg of product at a time, the preparation efficiency is low, and it is difficult to realize industrial scale production

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for preparing silicon-containing polyurea monodisperse microspheres with high yield by precipitation polymerization
  • A method for preparing silicon-containing polyurea monodisperse microspheres with high yield by precipitation polymerization
  • A method for preparing silicon-containing polyurea monodisperse microspheres with high yield by precipitation polymerization

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0010] Technical scheme of the present invention is as follows:

[0011] A method for preparing silicon-containing polyurea monodisperse microspheres with high yield by precipitation polymerization, comprising the steps of:

[0012] At room temperature, diisocyanate and polyamine are subjected to gradual precipitation polymerization in a reaction medium, wherein,

[0013] Silicon-containing polyamines account for 10-100% of the polyamines, and the remainder is ordinary polyamines that do not contain silicon;

[0014] The total amount of diisocyanate and polyamine monomer is 1-32% of the total mass of the system;

[0015] The molar ratio of the amine groups in the polyamine to the isocyanate groups in the diisocyanate (NH 2 / NCO) is 0.3~1.5:1;

[0016] After the diisocyanate and polyamine monomers are dissolved in the reaction medium, the reaction system is sealed, and the polymerization reaction is carried out at 20-80°C and the oscillation frequency is 0-300osc / min; after ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
particle sizeaaaaaaaaaa
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a method for preparing silicon-containing polyurea monodisperse microsphere with a high yield through precipitation polymerization. The method is characterized in that silicon-containing polyamine, common polyamine and diisocyanate are taken as monomers, and precipitation polymerization is performed in a mixed solvent of water / acetone / acetonitrile to prepare the silicon-containing polyurea monodisperse microsphere. According to the method disclosed by the invention, any emulsifier, stabilizer and catalyst are not needed, the monomers are completely converted after polymerization is completed, and the silicon-containing polymer microsphere is very clean, and can be applied to the fields such as biology and medicines. The method is simple to operate, and production cost and energy consumption are relatively low. Monomer dose while the monodisperse microsphere is prepared can be as high as about 30%, the microsphere yield can be 98%, polymerization time is short,and preparation efficiency is high, so that the method is beneficial for realizing large-scale production and application of silicon-containing polymer monodisperse microspheres.

Description

technical field [0001] The invention relates to a method for preparing silicon-containing polyurea monodisperse microspheres with high yield through precipitation polymerization, which belongs to the field of functional polymer materials. Background technique [0002] Silicon-containing polymers have low glass transition temperature and surface energy, as well as excellent dielectric properties and biocompatibility, which have attracted widespread attention from scientists. Silicon-containing polymer monodisperse microspheres combine the excellent performance of silicone with the characteristics of uniform size and flexible application of monodisperse microspheres, and have potential applications in the fields of chemical catalysis, drug delivery and enzyme immobilization. [0003] The silicon-containing polymer microspheres currently publicly reported are mainly prepared by radical polymerization of silicone monomers containing double bonds or polycondensation of small mole...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08G18/32C08G18/08B01J13/18
CPCB01J13/185C08G18/0866C08G18/3228C08G18/3893
Inventor 孔祥正齐鑫姜绪宝朱晓丽李树生
Owner UNIV OF JINAN
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com