Two-stage gas-liquid separation and recovery device for immersion type lithography machine

Abstract

The invention relates to a two-stage gas-liquid separation and recovery device for an immersion type lithography machine. The device comprises a gas-liquid separator, a gas-liquid separation tank, a liquid flow controller, a two-phase flow loop before gas-liquid separation, an exhaust loop after gas-liquid separation, and a drainage loop after gas-liquid separation. The gas-liquid separator is connected with the two-phase flow loop before gas-liquid separation and an upper inlet of the gas-liquid separation tank; the gas-liquid separation tank is connected with the exhaust loop after gas-liquid separation and an inlet of the liquid flow controller; the liquid flow controller and the gas-liquid separator are connected with the drainage loop after gas-liquid separation. By means of the device, continuous separation process of a gaseous phase and a liquid phase can be achieved under the action of negative-pressure suction, and the separation and recovery efficiency and effects are obviously improved compared with those of solutions in the prior art. Meanwhile, interference on negative pressure of a system is avoided, and gas and liquid in the system can be discharged in time under a fault condition to achieve timely decompression.

Description

technical field [0001] The invention belongs to the technical field of gas-liquid separation and recovery devices, and relates to a two-stage gas-liquid separation and recovery device for an immersion photolithography machine. Background technique [0002] The immersion lithography machine is developed on the basis of the traditional dry lithography machine. Compared with the dry lithography machine, the medium between the lower surface of the last projection objective lens and the photoresist on the silicon wafer is air. , The immersion lithography machine replaces the medium with a liquid with a high refractive index, which increases the numerical aperture of the projection objective lens, thereby improving the resolution and depth of focus of the lithography machine. Since it is based on the traditional dry photolithography technology, the liquid immersion method adopted is a partial immersion method. This immersion method is to fix the projection objective lens, and the...

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Problems solved by technology

The above implementation method has the following deficiencies: (1) The immersion lithography machine requires all other devices except the lithography machine body to be placed in the cabinet of the factory area, and the current gas-liquid separation tank will take up a lot of space. The separation of gas and liquid is carried out only by gravity, and the separation efficiency is not high, so the separation effect is not good; (2) Immersion lithography has very high index requirements for the flow rate and pressure inside the immersion flow field , therefore, the intermittent operation of the pump will cause large fluctuations in pressure and flow

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