Polishing device for producing monocrystalline silicon slices

Abstract

The invention discloses a polishing device for producing monocrystalline silicon slices. The polishing device comprises a bottom plate. A box is welded to the outer wall of the top end of the bottom plate, an operation window is formed in the outer wall of one side of the box, an upper liquid tank is welded to the inner wall of the top end of the box, a lower liquid tank is welded to the inner wall of the bottom end of the box, and the lower liquid tank and the upper liquid tank are both located on one side away from the operation window; and polishing liquid is contained in the upper liquid tank and the lower liquid tank, liquid flow switches distributed at equal distances are fixed to the outer wall of the bottom end of the upper liquid tank and the outer wall of the top end of the lowerliquid tank through bolts correspondingly, a first through hole is formed in the position, close to the top end, of the outer wall of one side of the box, and a second through hole is formed in the position, close to the bottom end, of the outer wall of one side of the box. According to the polishing device for producing the monocrystalline silicon slices, the structure is simple, the design is novel, workers can conveniently and rapidly operate the polishing device, both time and labor are saved, and the polishing quality of monocrystalline silicon can be higher and easier to meet the neededrequirements.

Description

technical field [0001] The invention relates to the technical field of single crystal silicon slice production, in particular to a polishing device for single crystal silicon slice production. Background technique [0002] Monocrystalline silicon is a relatively active non-metallic element. It is an important part of crystalline materials and is at the forefront of new material development. Its main uses are as semiconductor materials and the use of solar photovoltaic power generation, heating, etc., monocrystalline silicon slices Polishing refers to the need to improve micro-defects on the surface of single crystal silicon, so as to obtain high flatness polishing. At present, most of the polishing devices for single crystal silicon slices have the disadvantages of complex structure and inability to obtain high flatness polishing, which reduces work efficiency. Waste of resources. Contents of the invention [0003] The purpose of the present invention is to solve the shor...

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Problems solved by technology

[0002] Monocrystalline silicon is a relatively active non-metallic element. It is an important part of crystalline materials and is at the forefront of new material development. Its main uses are as semiconductor materials and the use of solar photovoltaic power generation, heating, etc., monocrystalline silicon slices Polishing refers to the need to improve micro-defects on the surface of single crystal silicon, so as to obtain high flatness polishing. At present, most of the polishing devices for single crystal silicon slices have the disadvantages of complex structure and inability to obtain high flatness polishing, which reduces work efficiency. wasted resources

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