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Vacuum decompression drying device

A technology of drying equipment and vacuum decompression, applied in optics, instruments, nonlinear optics, etc., can solve problems such as uneven coloring, achieve the effects of reducing uneven air distribution, preventing uneven coloring, and improving uneven coloring

Active Publication Date: 2017-12-01
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention provides a vacuum decompression drying equipment, which is used to solve the technical problem of uneven color caused by the accumulation of photoresist and solvent vapor on the substrate in the decompression drying process in the prior art

Method used

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Embodiment Construction

[0034] The present invention will be further described below in conjunction with accompanying drawing.

[0035] Such as image 3 As shown, the present invention provides a vacuum decompression drying equipment, which includes: a cover plate 1 and a chamber 2 inside the cover plate 1, the substrate is arranged in the chamber 2; Vacuum device 3; Vacuum breaking device 3 at least includes a first blowing hole array 31 and a second blowing hole array 32, and the first blowing hole array 31 and the second blowing hole array 32 all include multiple holes arranged along the long side direction of the cover plate 1 A blow hole 33. The blowing hole 33 is used to pass dry air (CDA) into the chamber 2 to restore the air pressure in the chamber 2 .

[0036] Such as image 3 As shown, the first row of blowing hole arrays 31 is close to the side wall of the cover plate 1 in the longitudinal direction, and the second row of blowing holes 32 is close to the other side wall of the cover pla...

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PUM

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Abstract

The invention discloses a vacuum decompression drying device, relates to the field of manufacturing of thin film transistor liquid crystal displays and is used for solving the technical problems that in the prior art, in the decompression drying manufacturing process, a light resistor on a substrate and solvent vapor are gathered in the middle area of the substrate, and consequently color is not uniform. The vacuum decompression drying device comprises a cover plate and a cavity; a first gas blowing hole array and a second gas blowing hole array on the cover plate each comprise gas blowing holes distributed in the long side direction of the cover plate, thus, in the vacuum breaking process, gas flow distribution in the whole cavity is more uniform, the distance from the position of the gas blowing holes to the center area of the substrate is shorter, gas flow in the center area can be effected more easily, and the phenomenon that the solvent vapor congeals and consequently the color of the substrate is not uniform is prevented.

Description

technical field [0001] The invention relates to the field of manufacturing thin film transistor liquid crystal displays, in particular to a vacuum decompression drying equipment. Background technique [0002] Existing vacuum decompression drying equipment (VCD) such as figure 1 and figure 2 As shown, when the substrate is placed on the positioning pin (Pin) of the vacuum decompression drying equipment by the robot, the vacuum decompression drying equipment starts the process, and after the process is completed, dry air (CDA) is introduced into the cover plate , to restore the air pressure in the chamber. [0003] Since the photoresist is composed of solvents, sensitizers, resins, and additives, the solvents account for more than 75% of all components. After the substrate is coated with photoresist, the photoresist film layer on the substrate still has greater fluidity. Even after the decompression drying process of the vacuum decompression drying equipment, the photores...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05D3/04G02F1/13
CPCB05D3/042B05D3/0493G02F1/1303
Inventor 郭开超
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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