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Laser impact wave-based optical performance post-processing method for thin film element

A thin-film element and optical performance technology, applied in the field of optical thin-film element post-processing, can solve the problems of poor repeatability, difficult control, and different degrees of improvement, and achieve the effects of improved accuracy, improved stability, and improved flexibility and controllability

Inactive Publication Date: 2017-06-30
昆山星谕传感科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Heat treatment is annealing, which is currently mainly used to release the residual stress of the film and improve the surface shape; through the influence of the surface morphology and microstructure of the optical film, it can increase the surface packing density of the film to a certain extent and improve the optical stability. , but the repeatability is poor, the heat treatment process parameters required for different materials, different coating parameters, and different types of thin film components are also different, and the degree of improvement is also different, so there are problems such as difficulty in control in practical applications

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] (1) A 1064nm high-reflection film with a size of φ50×5mm was fabricated by electron beam evaporation, and an infrared Fourier spectrometer with an in-situ reaction cell was used to measure the in-situ infrared spectrum of the thin-film element during the heating process in real time, and the obtained results were obtained due to the heating process. The change characteristics of the transmittance of the optical thin film element caused by the desorption T 0 ;

[0030] (2) Setting the initial incident laser energy E of the pump laser used for laser shock wave processing 0 , the maximum incident laser energy E m and the laser energy increasing gradient ΔE, the selected spot size is 2mm, the overlap rate is 90%, and the scanning area size is 10×10mm; Requirement E 0 and E m Less than the maximum laser energy that prevents damage to the thin film element when the laser shock wave acts; and mark S as less than or equal to (E m -E 0 ) / ΔE is the largest integer; let i=1; ...

Embodiment 2

[0042] (1) A 532nm anti-reflection film with a size of φ30×3mm was fabricated by electron beam evaporation, and an infrared Fourier spectrometer with an in-situ reaction cell was used to measure the in-situ infrared spectrum of the thin film element during the heating process in real time, and the obtained results were obtained due to the heating process. The change characteristics of the transmittance of the optical thin film element caused by the desorption T 0 ;

[0043] (2) Setting the initial incident laser energy E of the pump laser used for laser shock wave processing 0 , the maximum incident laser energy E m and the laser energy increasing gradient ΔE, the selected spot size is 1mm, the overlap rate is 90%, and the scanning area size is 10×10mm; Requirement E 0 and E m Less than the maximum laser energy that prevents damage to the thin film element when the laser shock wave acts; and mark S as less than or equal to (E m -E 0 ) / ΔE is the largest integer; let i=1; ...

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Abstract

The invention provides a laser impact wave-based optical performance post-processing method for a thin film element. Based on variation characteristic T0 of thin film element transmittance in temperature rising processes when no laser impact wave post-processing operation is conducted, rules of how E0, Em and [delta]E affect variation characteristic TS of the thin film element transmittance in sample temperature rising processes after S times of laser impact wave processing operation are obtained; according to TS rising conditions, the initial laser energy E0, the energy progressive increase gradient [delta]E and the maximum laser energy Em are optimized; when a variation characteristic curve of the thin film element transmittance does not change along with temperature change and transmittance or reflectivity of corresponding wavelength satisfies requirements for a tested sample, circulation is stopped, and post-processing operation of optical performance of the thin film element is completed. Via the method, optical performance and specifically stability of a high power optical thin film element can be improved; based on real time on-line adjustment post-processing technology parameters, a difficult problem that optical performance of a low stacking density thin film can be easily affected by environment can be solved.

Description

technical field [0001] The invention belongs to the technical field of post-processing of optical thin-film components, and in particular relates to a post-processing method for improving the optical properties of optical thin-film components by using laser shock wave technology. Background technique [0002] The development of modern high-power laser technology, especially the development of large-aperture systems, puts forward more and more stringent requirements on the performance of optical thin-film components, requiring them to have high optical precision, high damage threshold and high-precision surface shape control, which will directly affect To realize the function of the large-aperture precision optical system and the stability of the system for a long time. There are many factors that affect the performance of optical thin films, including the characteristics of the thin film itself, the preparation process of the thin film, and the laser parameters. [0003] Op...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/12G01N21/3563G01N21/59
CPCG01N21/3563G01N21/59G01N2021/3595G02B1/12
Inventor 刘文文曹宇张健朱德华
Owner 昆山星谕传感科技有限公司
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