Triplet state and triplet state annihilation up-conversion chemiluminescent system based on photonic crystal and preparation method thereof
A triplet annihilation and photonic crystal technology, applied in the field of nonlinear optical materials, can solve the problems of low quantum yield and limited practical application, and achieve the effect of simple preparation and improved up-conversion luminous efficiency
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[0043] Aiming at the triplet-triplet annihilation upconversion luminescence system as described above, the present invention also provides a preparation method of a triplet-triplet annihilation upconversion luminescence system based on photonic crystals, which is simple to prepare, does not require complicated processes, and is applicable It is strong, can obtain the luminescence of various up-conversion components, has high up-conversion efficiency, has high stability, is safe and environmentally friendly, and is suitable for industrial production. Described preparation method comprises the steps:
[0044] S1. Prepare up-conversion solution.
[0045] Wherein, when configuring the up-converting solution, a photosensitizer and an annihilation agent are provided, and the two are mixed in proportion to prepare an organic solution of the photosensitizer and annihilation agent.
[0046] S2. By vertical deposition method, monodisperse polymer latex microspheres are assembled on the...
Embodiment 1
[0057] In the present embodiment, photosensitizer adopts metal porphyrin complex PdOEP, and its molecular structural formula is:
[0058]
[0059] In this embodiment, the annihilation agent adopts condensed ring aromatic hydrocarbon AnCOOH, and its molecular structural formula is:
[0060]
[0061] The preparation of poly(styrene-methyl methacrylate-acrylic acid) photonic crystal film (band gap is 542nm): 1) glass sheet and beaker are immersed in chromic acid washing solution and cleaned overnight, then cleaned with ultrapure water, and washed with Blow dry with nitrogen to achieve complete hydrophilization and cleanliness of the surface; 2) The glass sheet is vertically fixed and immersed in a dispersion of monodisperse poly(styrene-methyl methacrylate-acrylic acid) latex microspheres with a particle size of 255 nm. (mass concentration is about 0.15%) in a small beaker, placed in a constant temperature and humidity chamber with a temperature of 60 ° C and a humidity of ...
Embodiment 2
[0065] The photosensitizer and annihilation agent used in this example are the same as in Example 1.
[0066] The preparation of poly(styrene-methyl methacrylate-acrylic acid) photonic crystal film (band gap is 439nm): 1) soak the glass sheet and beaker in chromic acid washing solution to clean overnight, then clean with ultrapure water, and use Blow dry with nitrogen to achieve complete hydrophilization and cleaning of the surface; 2) The glass sheet is vertically fixed and immersed in a dispersion of monodisperse poly(styrene-methyl methacrylate-acrylic acid) latex microspheres with a particle size of 220 nm. (mass concentration is about 0.15%) in a small beaker, placed in a constant temperature and humidity chamber with a temperature of 60 ° C and a humidity of 60%, and after 2-3 days the solution evaporates, and the solution is deposited on the surface of the glass substrate by vertical deposition. Assembled into poly(styrene-methyl methacrylate-acrylic acid) colloidal pho...
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