Voltage-resistant terminal ring structure and power devices
A terminal ring and voltage-resistant ring technology, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve problems such as unstable breakdown voltage, achieve stable breakdown voltage, prevent premature breakdown, and alleviate breakdown voltage the effect of the influence
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[0047] The specific structure of the pressure-resistant terminal ring is as follows: image 3 As shown, the structure has four additional ion implantation regions compared with the structure in the prior art. Among them, the substrate 1 is an N-type silicon doped region, the withstand voltage ring 21, the additional ion implantation region 6 and the stop ring 22 are all heavily doped P-type regions, the dielectric film 4 is a silicon dioxide layer, and the field plate 3 is It is a metal field plate of aluminum silicon copper, and the passivation film 5 is a silicon nitride film.
[0048] The additional ion implantation region can make the curve of the depletion region close to it smooth and gentle, alleviate the curvature effect of the depletion region, prevent premature breakdown of power devices, and alleviate the influence of curvature effect on the breakdown voltage, so that The breakdown voltage is relatively stable, which further ensures the reliability of the device. ...
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