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Miura - Ori origami structure electromagnetic stealthl plate of loaded graphene metamaterial unit

A unit structure and stealth board technology, applied in shielding materials, electrical components, magnetic field/electric field shielding, etc., can solve the problems of single frequency modulation dimension space, frequency modulation bandwidth range and mechanism limitations, and achieve the effect of wide absorption efficiency

Inactive Publication Date: 2017-05-17
BEIJING INSTITUTE OF TECHNOLOGYGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] The purpose of the present invention is to provide a Miura-Ori origami structure electromagnetic cloaking plate loaded with graphene metamaterial units in order to solve the problem of frequency modulation bandwidth range and mechanism limitations and the frequency modulation dimension space is single

Method used

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  • Miura - Ori origami structure electromagnetic stealthl plate of loaded graphene metamaterial unit
  • Miura - Ori origami structure electromagnetic stealthl plate of loaded graphene metamaterial unit
  • Miura - Ori origami structure electromagnetic stealthl plate of loaded graphene metamaterial unit

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Step 1: Dissolve graphene oxide in water to prepare a graphene oxide aqueous solution with a concentration of 7.5 mg / ml, add hydroquinone to the graphene oxide aqueous solution, and stir evenly; the mass ratio of hydroquinone to graphene oxide is 5 ;

[0031] Step 2: Immerse the substrate in the above mixed solution, and seal it; heat preservation treatment at 100°C for 10 hours, so that the absorbing medium is attached to the substrate; the substrate is polymer fabric or polymer foam; the thickness of the substrate is 2mm ;

[0032] Step 3: Take the substrate with the absorbing medium out of the mixture, soak it in water and wash it, spread it into a straight plate, freeze it at -40°C for 10 hours, and dry it at room temperature for 48 hours to obtain a graphene woven fabric ;

[0033] Step 4: Mix epoxy resin and epoxy resin curing agent in a mass ratio of 1:3 to form an epoxy resin precursor solution; dip the graphene fabric obtained in step 3 into the epoxy resin p...

Embodiment 2

[0039] Step 1: dissolving graphene oxide in water to prepare a graphene oxide aqueous solution with a concentration of 4 mg / ml, adding hydroquinone to the graphene oxide aqueous solution, and stirring evenly; the mass ratio of hydroquinone to graphene oxide is 2;

[0040] Step 2: Immerse the substrate in the above mixture, and seal it; heat preservation treatment at 120°C for 8 hours to attach the absorbing medium to the substrate; the substrate is polymer fabric or polymer foam; the thickness of the substrate is 2mm ;

[0041] Step 3: Take the substrate with the absorbing medium out of the mixture, soak it in water and wash it, spread it into a straight plate, freeze it at -40°C for 12 hours, and then dry it at room temperature for 36 hours to obtain a graphene woven fabric ;

[0042] Step 4: Mix epoxy resin and epoxy resin curing agent in a mass ratio of 1:3 to form an epoxy resin precursor solution; dip the graphene fabric obtained in step 3 into the epoxy resin precursor ...

Embodiment 3

[0048] Step 1: Dissolving graphene oxide in water to prepare a graphene oxide aqueous solution with a concentration of 2 mg / ml, adding hydroquinone to the graphene oxide aqueous solution, and stirring evenly; the mass ratio of hydroquinone to graphene oxide is 1;

[0049] Step 2: Immerse the substrate in the above mixture, and seal it; heat preservation treatment at 100°C for 8 hours, so that the absorbing medium is attached to the substrate; the substrate is polymer fabric or polymer foam; the thickness of the substrate is 2mm ;

[0050] Step 3: Take out the substrate attached with the absorbing medium from the mixture, soak it in water and wash it, spread it into a straight plate, freeze it at -40°C for 10 hours, and then dry it at room temperature for 30 hours to obtain a graphene woven fabric ;

[0051] Step 4: Mix epoxy resin and epoxy resin curing agent in a mass ratio of 1:3 to form an epoxy resin precursor solution; dip the graphene fabric obtained in step 3 into the ...

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Abstract

The invention is a miura - Ori origami structure electromagnetic stealth plate of loaded graphene metamaterial unit. An electromagnetic stealth plate of the invention is prepared by immersing a substrate in a mixture of hydroquinone and graphene oxide and sealing a heat treatment so as to attach absorbing medium to the substrate; after removing and cleaning, drying by freeze treatment to obtain graphene Weaving; graphene woven cloth is immersed in an epoxy resin precursor solution, paved, heated, and cured, to get an electromagnetic stealth plate; the electromagnetic stealth plate in accordance with Miura - Ori origami method of processing creases, so that the electromagnetic stealth plate along the crease Deformation; and in the electromagnetic stealth plate on the plate surface of the super-material unit.

Description

technical field [0001] The invention belongs to the field of design and preparation of frequency modulation stealth materials and structures, and in particular relates to a graphene / polymer new composite structure electromagnetic stealth board with adjustable frequency absorbing stealth performance. Background technique [0002] High-performance electromagnetic stealth materials (materials with strong absorption and weak reflection functions for electromagnetic waves) are in urgent demand in the fields of detection, communication, aerospace, aviation, and advanced equipment. Electromagnetic stealth technology uses electromagnetic stealth materials and structures to weaken, suppress, absorb, and deflect the intensity of electromagnetic waves to minimize the probability of (radar electromagnetic wave) detection system discovering and identifying (detecting targets). With the development of the information age, high-performance electromagnetic stealth materials have huge applic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01Q17/00H05K9/00
CPCH01Q17/007H01Q17/00H05K9/00H05K9/0073
Inventor 宋维力陈浩森陈明继方岱宁
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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