Cleaning equipment cleaning brush after cmp concentric locking structure and usage method

Abstract

A concentric snap-in structure and usage method of the cleaning brush of CMP post-cleaning equipment. The structure includes a cleaning brush, an idler shaft structure positioned with a tapered hole and a rectangular groove to transmit force to the cleaning brush, and a square structure positioned with the cleaning brush with a tapered hole. The telescopic drive shaft structure uniformly transmits force, the left swing frame supports the idler shaft structure, and the right swing frame supports the telescopic drive shaft structure. The cleaning brush includes a brush shaft and a brush set on the brush shaft. The right end of the brush shaft has a centering cone shaft and a square shaft that are concentric with the telescopic drive shaft structure. The left end of the brush shaft has a centering cone shaft and a rectangular shaft that are concentric with the idler shaft structure. The center of the centering cone shaft is equipped with a brush shaft. Pure water inlet connected to the inner cavity of the shaft. The invention has a compact and concise structure, which optimizes the cleaning and swiping card connection layout, can effectively improve the concentricity of the card connection, the sealing performance of the pure water penetration interface end, and has convenient quick changeability.

Description

technical field [0001] The invention relates to a concentric clamping structure of a cleaning brush of cleaning equipment after CMP, and a method for using the concentric clamping structure. Background technique [0002] CMP (chemical mechanical Polishing) post-cleaning equipment is equipment for surface precision cleaning after high-precision polishing on the surface of electronic device wafers. In the post-CMP cleaning process, scrubbing with a brush combined with a spray medium is an effective way to remove contaminants on the wafer surface. [0003] At present, the overseas prototypes of post-cleaning equipment that can be seen are connected to the cleaning brush in the following way: the cleaning brush idler shaft unit and the cleaning brush drive shaft unit are superimposed as one. This clamping method results in a complex structure of the equipment and concentrated functions, especially when the two ends of the cleaning brush are docked with square positioning, resul...

AI Technical Summary

Problems solved by technology

[0005] The present invention provides a concentric clamping structure and usage method of cleaning brushes of post-CMP cleaning equipment. It is necessary to solve the problem of complex cleaning brush clamping structure of existing post-CMP cleaning equipment, large concentricity deviation of two ends of cleaning brushes, and poor wetting effect of cleaning brushes. , technical problems such as poor cleaning effect and inconvenient replacement

Images